公开(公告)号：US20170363965A1

公开(公告)日：2017-12-21

申请号：US15525610

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Raoul Maarten Simon KNOPS ,  Bob STREEFKERK ,  Christiaan Louis VALENTIN ,  Jan Bernard Plechelmus VAN SCHOOT ,  Wilhelmus Franciscus Johanne SIMONS ,  Leon Leonardus Franciscus MERKX ,  Robertus Johannes Marinus DE JONGH ,  Roel Johannes Elisabeth MERRY ,  Michael Frederik YPMA

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70266 ,  G03F7/705 ,  G03F7/706

Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.

公开(公告)号：US20240160108A1

公开(公告)日：2024-05-16

申请号：US18282246

申请日：2022-02-24

Applicant: ASML Netherlands B.V.

Inventor： Nikolaos SOTIROPOULOS ,  Albertus HARTGERS ,  Michael Frederik YPMA ,  Marco Matheus Louis STEEGHS

IPC: G03F7/00

CPC classification number: G03F7/70141 ,  G03F7/70066 ,  G03F7/70525 ,  G03F7/7085 ,  G03F7/70891

Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam and a uniformity correction system configured to adjust an intensity profile of the radiation beam. The lithographic apparatus comprises a control system configured to control the uniformity correction system at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus.