公开(公告)号：US20240361698A1

公开(公告)日：2024-10-31

申请号：US18565200

申请日：2022-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus HARTGERS ,  Marco Matheus Louis STEEGHS ,  Gerardus Hubertus Petrus Maria SWINKELS ,  Giovanni IMPONENTE ,  Nicholas William Maria PLANTZ ,  Wouter Joep ENGELEN ,  Marcus Adrianus VAN DE KERKHOF

IPC: G03F7/20

CPC classification number: G03F7/2002

Abstract: A plate for use in an imaging system to determine at least two optical properties of an illumination beam of the imaging system, the imaging system configured to illuminate an illumination region with the illumination beam, the plate including a plurality of markers, wherein a first subset of the plurality of markers includes a first type of markers for determining a first optical property of the illumination beam, and a second subset of the plurality of markers includes a second type of markers for determining a second optical property of the illumination beam, wherein the plurality of markers are located within a marker region of the plate and the marker region generally corresponds to the illumination region.

公开(公告)号：US20240160108A1

公开(公告)日：2024-05-16

申请号：US18282246

申请日：2022-02-24

Applicant: ASML Netherlands B.V.

Inventor： Nikolaos SOTIROPOULOS ,  Albertus HARTGERS ,  Michael Frederik YPMA ,  Marco Matheus Louis STEEGHS

IPC: G03F7/00

CPC classification number: G03F7/70141 ,  G03F7/70066 ,  G03F7/70525 ,  G03F7/7085 ,  G03F7/70891

Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam and a uniformity correction system configured to adjust an intensity profile of the radiation beam. The lithographic apparatus comprises a control system configured to control the uniformity correction system at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus.