公开(公告)号：US10649347B2

公开(公告)日：2020-05-12

申请号：US16219449

申请日：2018-12-13

Applicant: ASML Netherlands B.V.

Inventor： Michael Johannes Christiaan Ronde ,  Lucas Kuindersma ,  Niels Johannes Maria Bosch ,  Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Marc Wilhelmus Maria Van Der Wijst ,  Thijs Verhees ,  Sander Kerssemakers

IPC: G03B27/42 ,  G03F7/20 ,  H01J37/26

Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.

公开(公告)号：US10409175B2

公开(公告)日：2019-09-10

申请号：US15027986

申请日：2014-10-22

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Marc Wilhelmus Maria Van Der Wijst ,  Thijs Verhees ,  Sander Kerssemakers

IPC: G03B27/42 ,  G03F7/20

Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.