公开(公告)号：US10016250B2

公开(公告)日：2018-07-10

申请号：US15640304

申请日：2017-06-30

Applicant: Advanced Technology Inc.

Inventor： Byoung Chan Choi ,  Doo Baeck An

IPC: B23K26/342 ,  A61B90/00 ,  G01J1/42 ,  A61F9/008 ,  B23K26/03 ,  B23K26/36 ,  B23K26/082 ,  B23K26/0622 ,  G01J1/04

CPC classification number: A61B90/361 ,  A61F9/008 ,  A61F9/00834 ,  A61F2009/00897 ,  B23K26/032 ,  B23K26/0624 ,  B23K26/082 ,  B23K26/36 ,  G01J1/0414 ,  G01J1/4257

Abstract: A laser patterning apparatus for a three-dimensional object includes a laser generator, a beam expander configured to adjust a size of a laser beam generated by the laser generator, a dynamic focusing module configured to adjust a z-axis focus position of the laser beam passing through the beam expander, a scan head configured to adjust x- and y-axis focus position of the laser beam passing through the beam expander, a shape recognizer configured to recognize a shape of a three-dimensional object, and a controller configured to extract x-, y-, and z-axis data of the three-dimensional object and to control the scan head and the dynamic focusing module, in order to pattern the three-dimensional object with the laser beam.