公开(公告)号：US11540408B2

公开(公告)日：2022-12-27

申请号：US15217605

申请日：2016-07-22

申请人： Apple Inc.

发明人： Lucy Elizabeth Browning ,  Charles B. Woodhull ,  Bryan Patrick Kiple ,  David A. Pakula ,  Tang Yew Tan ,  Julie Hanchak-Connors ,  John Murray Thornton, III ,  Thomas Johannessen ,  Peter Russell-Clarke ,  Masashige Tatebe ,  Napthaneal Y. Tan

IPC分类号： H05K5/04 ,  H05K5/02 ,  C25D11/02 ,  C25D11/12 ,  C25D11/24 ,  B23P11/00 ,  B23P17/00 ,  G03F1/38 ,  H01Q1/24 ,  H04M1/02 ,  C25D11/34 ,  H05K13/00 ,  H05K5/03 ,  H01Q1/42 ,  B23C5/10 ,  B23C5/00 ,  B23P17/02 ,  H04M1/11

摘要： Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods involve forming a first anodization layer and an adjacent second anodization layer on an angled surface, the interface between the two anodization layers being regular and uniform. Described are photomasking techniques and tools for providing sharply defined corners on anodized and texturized patterns on metal surfaces. Also described are techniques and tools for providing anodizing resistant components in the manufacture of electronic devices.