公开(公告)号：US20200037399A1

公开(公告)日：2020-01-30

申请号：US16595801

申请日：2019-10-08

Applicant: Applied Materials, Inc.

Inventor： Chunlei ZHANG ,  Phillip CRIMINALE ,  Steven E. BABAYAN ,  David ULLSTROM

IPC: H05B1/02 ,  H01L21/67 ,  H01L21/683 ,  H01L21/66

Abstract: Implementations described herein provide a method for processing a substrate on a substrate support assembly which enables both lateral and azimuthal tuning of the heat transfer between an electrostatic chuck and a substrate. The method includes processing a first substrate using a first temperature profile on a substrate support assembly having primary heaters and spatially tunable heaters. A deviation profile is determined from a result of processing the first substrate. The spatially tunable heaters are controlled in response to the deviation profile to enable discrete lateral and azimuthal tuning of local hot or cold spots on the substrate support assembly in forming a second temperature profile. A second substrate is then processed using the second temperature profile.

公开(公告)号：US20180061679A1

公开(公告)日：2018-03-01

申请号：US15683967

申请日：2017-08-23

Applicant: APPLIED MATERIALS, INC.

Inventor： Fernando M. SILVEIRA ,  Chunlei ZHANG ,  David ULLSTROM ,  Michael R. RICE

IPC: H01L21/67 ,  H01J37/32

Abstract: Methods and apparatus for a multi-chamber processing system having shared vacuum systems are disclosed herein. In some embodiments, a multi-chamber processing system for processing substrates includes a first process chamber; a second process chamber; a first vacuum system coupled to the first and second process chambers through first and second valves and to a first shared vacuum pump; and a second vacuum system coupled to the first and second process chambers through third and fourth valves and to a second shared vacuum pump, wherein the second vacuum system is fluidly independent from the first vacuum system.