公开(公告)号：US20230187165A1

公开(公告)日：2023-06-15

申请号：US17551849

申请日：2021-12-15

Applicant: Applied Materials, Inc.

Inventor： June Young Kim ,  Jin Young Choi ,  Yong-Seok Hwang ,  Kyoung-Jae Chung ,  Bon-Woong Koo

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/09 ,  C23C14/48 ,  C23C14/52

CPC classification number: H01J37/08 ,  C23C14/48 ,  C23C14/52 ,  H01J37/09 ,  H01J37/3171

Abstract: An IHC ion source having increased plasma potential is disclosed. In certain embodiments, the extraction plate is biased at a higher voltage than the body of the arc chamber to achieve the higher plasma potential. Shielding electrodes may be utilized to remove the interaction between the biased extraction plate and the plasma. The cross-section of the arc chamber may be circular or nearly circular to facilitate the rotation of electrons in the chamber. In another embodiment, biased electrodes may be disposed in the chamber on opposite sides of the extraction aperture in the height direction. In some embodiments, only one of the electrodes is biased at a voltage greater than the body of the arc chamber.

公开(公告)号：US12154755B2

公开(公告)日：2024-11-26

申请号：US17551849

申请日：2021-12-15

Applicant: Applied Materials, Inc.

Inventor： June Young Kim ,  Jin Young Choi ,  Yong-Seok Hwang ,  Kyoung-Jae Chung ,  Bon-Woong Koo

IPC: H01J37/09 ,  C23C14/48 ,  C23C14/52 ,  H01J37/08 ,  H01J37/317

Abstract: An IHC ion source having increased plasma potential is disclosed. In certain embodiments, the extraction plate is biased at a higher voltage than the body of the arc chamber to achieve the higher plasma potential. Shielding electrodes may be utilized to remove the interaction between the biased extraction plate and the plasma. The cross-section of the arc chamber may be circular or nearly circular to facilitate the rotation of electrons in the chamber. In another embodiment, biased electrodes may be disposed in the chamber on opposite sides of the extraction aperture in the height direction. In some embodiments, only one of the electrodes is biased at a voltage greater than the body of the arc chamber.