-
公开(公告)号:US20200035540A1
公开(公告)日:2020-01-30
申请号:US16049037
申请日:2018-07-30
Applicant: Applied Materials, Inc.
Inventor: Paneendra Prakash Bhat , Mehmet Samir , Nikolai Kalnin
IPC: H01L21/687 , G01C9/02 , H01L21/67
Abstract: Exemplary apparatuses for centering and/or leveling a pedestal of a processing chamber may include a mounting block having a central axis, a set of first gauges mounted on the mounting block, and a set of second gauges mounted on the mounting block. The set of second gauges may be mounted substantially perpendicular to the set of first gauges. The plurality of first gauges may be configured to obtain measurements indicative of a degree of parallelism between a gas distribution plate of the processing chamber and the pedestal. The plurality of second gauges may be configured to obtain measurements indicative of a degree of axial alignment of a ring member of the processing chamber and the pedestal. The exemplary apparatuses may be used for centering and/or leveling the pedestal under vacuum.
-
公开(公告)号:US10672642B2
公开(公告)日:2020-06-02
申请号:US16049037
申请日:2018-07-30
Applicant: Applied Materials, Inc.
Inventor: Paneendra Prakash Bhat , Mehmet Samir , Nikolai Kalnin
IPC: H01L21/687 , G01C9/02 , H01L21/67 , H01J37/32
Abstract: Exemplary apparatuses for centering and/or leveling a pedestal of a processing chamber may include a mounting block having a central axis, a set of first gauges mounted on the mounting block, and a set of second gauges mounted on the mounting block. The set of second gauges may be mounted substantially perpendicular to the set of first gauges. The plurality of first gauges may be configured to obtain measurements indicative of a degree of parallelism between a gas distribution plate of the processing chamber and the pedestal. The plurality of second gauges may be configured to obtain measurements indicative of a degree of axial alignment of a ring member of the processing chamber and the pedestal. The exemplary apparatuses may be used for centering and/or leveling the pedestal under vacuum.
-