公开(公告)号：US11443420B2

公开(公告)日：2022-09-13

申请号：US17135939

申请日：2020-12-28

Applicant: Applied Materials Israel Ltd.

Inventor： Roman Kris ,  Grigory Klebanov ,  Einat Frishman ,  Tal Orenstein ,  Meir Vengrover ,  Noa Marom ,  Ilan Ben-Harush ,  Rafael Bistritzer ,  Sharon Duvdevani-Bar

IPC: G06T7/00 ,  G03F7/20 ,  G01N21/95

Abstract: There is provided a system and method of generating a metrology recipe usable for examining a semiconductor specimen, comprising: obtaining a first image set comprising a plurality of first images captured by an examination tool, obtaining a second image set comprising a plurality of second images, wherein each second image is simulated based on at least one first image, wherein each second image is associated with ground truth data; performing a first test on the first image set and a second test on the second image set in accordance with a metrology recipe configured with a first parameter set, and determining, in response to a predetermined criterion not being met, to select a second parameter set, configure the metrology recipe with the second parameter set, and repeat the first test and the second test in accordance with the metrology recipe configured with the second parameter set.