公开(公告)号：US20170270232A1

公开(公告)日：2017-09-21

申请号：US15073310

申请日：2016-03-17

Applicant: Applied Materials Israel Ltd.

Inventor： Ziv PARIZAT ,  Moshe ROSENWEIG

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G03F1/84

Abstract: A system for design based inspection of a lithographic mask of a first layer of an article, the system may include a decision module and a memory module; wherein the memory module is configured to store (a) first layer information about an outcome of an illumination of the lithographic mask during a lithographic process, (b) design information related to an irrelevant area to be removed from the first layer of the article after a manufacturing of the first layer of the article; and wherein the decision module is configured to process the first layer information to detect lithographic mask defects and to reduce a significance of a lithographic mask defect that is positioned within the irrelevant area.