公开(公告)号：US5167096A

公开(公告)日：1992-12-01

申请号：US485278

申请日：1990-02-26

申请人： Atef Eltoukhy ,  Yassin Mehmandoust ,  Shiro Murakami

发明人： Atef Eltoukhy ,  Yassin Mehmandoust ,  Shiro Murakami

IPC分类号： B24B7/16 ,  B24B37/04 ,  G11B5/84

CPC分类号： G11B5/84 ,  B24B37/04 ,  B24B7/16 ,  Y10S977/724 ,  Y10S977/932

摘要： Method and apparatus for texturing a substrate for use in a magnetic recording disc. A texturing pad used in the invention has inner and outer coaxial regions, with the outer region being more compressible. When the pad and a substrate are rotated about parallel, offset axes, and pressed against one another in the presence of a particle slurry, the inner, less compressible region of the pad produces a deeper-groove texturing on an inner annular surface region of the disc.

摘要翻译： 用于纹理化用于磁记录盘的衬底的方法和装置。 本发明中使用的纹理衬垫具有内部和外部同轴区域，外部区域是更可压缩的。 当衬垫和衬底围绕平行的，偏移的轴线旋转并且在存在颗粒浆料时彼此压靠时，衬垫的内部不太可压缩的区域在衬垫的内部环形表面区域上产生更深的槽纹理 光盘。

公开(公告)号：US4816127A

公开(公告)日：1989-03-28

申请号：US814229

申请日：1985-12-27

申请人： Atef Eltoukhy

发明人： Atef Eltoukhy

IPC分类号： C23C14/04 ,  G11B5/64 ,  G11B5/84 ,  G11B5/851 ,  C23C14/34

CPC分类号： C23C14/044 ,  G11B5/64 ,  G11B5/84 ,  G11B5/851

摘要： A method of producing a thin-film magnetic disk having high coercivity and magnetic remanence, good loop squareness, and low fluctuation in peak-to-peak recording signal amplitude over an entire circular recording path. The novel aspects of the method which contribute to the performance characteristics of the disk are (a) layering a 300-1,000 .ANG. magnetic film containing between about 70-88% cobalt, 10-28% nickel, and 2-12% chromium over a 1,000-4,000 .ANG. chromium underlayer; (b) forming the film and underlayer under sputtering disposition conditions which prevent low-angle asymmetrical sputtering; and (c) shielding the disk substrate during sputtering in a manner which produces substantially uniform-thickness deposition.

摘要翻译： 一种制造在整个圆形记录路径上具有高矫顽磁力和磁剩磁性，良好的环形矩形度和峰峰值记录信号振幅的低波动的薄膜磁盘的方法。 有助于盘的性能特征的方法的新颖方面是（a）将含有约70-88％的钴，10-28％的镍和2-12％的铬的300-1,000的电磁膜分层在 1,000-4,000安格姆铬底层; （b）在防止低角度不对称溅射的溅射配置条件下形成膜和底层; 和（c）以溅射形式对盘基片进行屏蔽，其形成基本上均匀厚度的沉积。

公开(公告)号：US4697974A

公开(公告)日：1987-10-06

申请号：US821989

申请日：1986-01-24

申请人： Atef Eltoukhy

发明人： Atef Eltoukhy

IPC分类号： H01L21/00 ,  H01L21/677 ,  B65G67/02

CPC分类号： H01L21/67748 ,  H01L21/67173 ,  H01L21/67706 ,  H01L21/67724 ,  H01L21/6776 ,  H01L21/67778

摘要： A rapid-load system for loading a series of pallets into a sputtering apparatus. The system comprises a magazine having a plurality of vertically spaced pallet supports whose spacing is sufficient to allow insertion of a pallet into the magazine directly without contact between the pallet and magazine. The magazine is removably supported in a load-in chamber of the sputtering apparatus by a chamber track assembly. A movable loading cart in the system includes a shiftable carriage for moving a pallet supported on the carriage between loading and stacking positions, and a magazine track assembly on which the magazine can be vertically shifted to each of a series of insertion positions, at which a pallet can be moved on the carriage into a position between vertically adjacent magazine supports, without contact between the pallet and supports, and corresponding release positions, at which weight support for the pallet is transferred from the carriage to the magazine transfer track assembly for transferring the magazine from the support track assembly on the cart to the chamber track assembly within the load-in chamber with the cart position adjacent the load-in chamber.

摘要翻译： 一种用于将一系列托盘装载到溅射装置中的快速加载系统。 该系统包括具有多个垂直间隔的托盘支架的仓，其间隔足以允许托盘直接插入托盘而不与托盘和托盘之间接触。 该盒通过室轨道组件可移除地支撑在溅射装置的承载室中。 系统中的可移动装载车包括可移动托架，用于在装载和堆放位置之间移动支撑在托架上的托盘，以及弹匣导轨组件，弹匣可垂直移动到一个插入位置上， 托盘可以在托架上移动到垂直相邻的托架支撑件之间的位置，而不会在托盘和支撑件之间接触，以及相应的释放位置，托盘的重量支撑件从托架传送到托架传送轨道组件， 盒子从推车上的支撑轨道组件到装载室内的室轨道组件，其中推车位置邻近承载室。

公开(公告)号：US4604179A

公开(公告)日：1986-08-05

申请号：US706737

申请日：1985-02-28

申请人： Atef Eltoukhy ,  Rick C. Price

发明人： Atef Eltoukhy ,  Rick C. Price

IPC分类号： C23C14/04 ,  G11B5/64 ,  G11B5/84 ,  G11B5/851 ,  H01J37/08

CPC分类号： G11B5/64 ,  C23C14/044 ,  G11B5/84 ,  G11B5/851 ,  Y10T428/12535 ,  Y10T428/12854

摘要： A baffle for use in achieving a substantially isotropic grain structure in a crystalline layer which is sputtered onto a substrate by moving the substrate linearly, and without rotation, in a front-to-back direction below a sputtering target. The baffle has front and back shields which are adapted to limit deposition of sputtered material onto the moving substrate substantially to substrate regions which directly underlie the target. A pair of strips in the baffle are constructed to effect substantially symmetrical sputtering of material onto the substrate surface from opposite target side directions, to produce an isotropic crystal structure during early phases of film deposition.

摘要翻译： 一种挡板，用于通过在垂直于溅射靶的前后方向上直线运动并且不旋转地将衬底溅射到基底上而实现基本上各向同性的晶粒结构。 挡板具有前屏蔽和后屏蔽，其适于限制将溅射的材料沉积到移动的基板上，基本上直接位于靶的正下方的基底区域上。 挡板中的一对条被构造成使材料从相对的目标侧面方向基本上对称地溅射到基板表面上，以在膜沉积的早期阶段产生各向同性的晶体结构。