公开(公告)号：US12084628B2

公开(公告)日：2024-09-10

申请号：US16762275

申请日：2018-11-26

Applicant: BASF SE

Inventor： I Chen Chou ,  Andreas Klipp ,  Berthold Ferstl

IPC: C11D1/66 ,  C11D1/00 ,  C11D1/722 ,  C11D1/83 ,  C11D3/20 ,  C11D3/24 ,  C11D3/30 ,  G03F7/40 ,  H01L21/02 ,  C11D1/72

CPC classification number: C11D1/83 ,  C11D1/006 ,  C11D1/66 ,  C11D1/722 ,  C11D3/245 ,  G03F7/40 ,  H01L21/02057 ,  C11D1/004 ,  C11D1/72 ,  C11D2111/22

Abstract: Described is a composition comprising as primary surfactant an ionic compound comprising one or more fluoroalkyl groups and as secondary surfactant at least one non-ionic compound comprising one or more polyalkyloxy and/or polyalkylenoxy groups, for cleaning or rinsing a product, preferably a product used in the semiconductor industry, and a respective use of said composition. Further described is a method of making a cleaned or rinsed product, preferably a product used in the semiconductor industry, comprising a substrate and supported thereon a patterned material layer having line-space structures with a line width of 50 nm or below, comprising the step of cleaning or rinsing said product with the composition of the invention.