公开(公告)号：US20040115443A1

公开(公告)日：2004-06-17

申请号：US10724485

申请日：2003-11-28

Applicant: Cardinal CG Company

Inventor： Robert Bond ,  Roger P. Stanek ,  Wayne Hoffman

IPC: B32B017/06 ,  B05D001/36 ,  B05D005/06

CPC classification number: C03C17/3615 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3642 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  C03C2217/78 ,  C03C2218/154 ,  G02B1/105 ,  G02B1/14 ,  G02B5/208 ,  Y10T428/24975 ,  Y10T428/265

Abstract: Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 null to 150 null in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.

Abstract translation: 包含透明非金属基底和透明膜叠层的透明物品被溅射沉积在基底上。 膜叠层的特征在于在所述介电膜上包括至少一个红外反射金属膜，金属膜上的电介质膜和厚度为10埃至150埃的保护性氮化硅膜。 电介质膜理想地具有与氮化硅基本上相同的折射率并且与氮化硅膜邻接。