公开(公告)号：US20110216298A1

公开(公告)日：2011-09-08

申请号：US13041989

申请日：2011-03-07

申请人： Dirk Heinrich EHM ,  Timo LAUFER ,  Ben BANNEY ,  Jens KUGLER ,  Ulrich NIEKEN ,  Franz KELLER

发明人： Dirk Heinrich EHM ,  Timo LAUFER ,  Ben BANNEY ,  Jens KUGLER ,  Ulrich NIEKEN ,  Franz KELLER

IPC分类号： G03B27/54

CPC分类号： G03F7/70933 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70983

摘要： In EUV lithography apparatuses (10), it is proposed, in order to lengthen the lifetime of contamination-sensitive components, to arrange them in a protection module. The protection module comprises a housing (23-29) having at least one opening (37-47), in which at least one component (13a, 13b, 15, 16, 18, 19) is arranged and at which one or more gas feeds (30-36) are provided in order to introduce a gas flow into the housing (23-29), which emerges through the at least one opening (37-47). In order to effectively prevent contaminating substances from penetrating into the protection module, a light source (48-56) is arranged at the at least one opening (37-47), which light source illuminates the opening (37-47) with one or more wavelengths by which the contaminating substances can be dissociated before they penetrate through the opening (37-47).

摘要翻译： 在EUV光刻设备（10）中，为了延长污染敏感元件的寿命，提出将它们安置在保护模块中。 保护模块包括具有至少一个开口（37-47）的壳体（23-29），其中布置有至少一个部件（13a，13b，15,16,18,19），并且一个或多个气体 提供进料（30-36）以便将气流引入通过至少一个开口（37-47）出现的壳体（23-29）中。 为了有效地防止污染物质渗透到保护模块中，光源（48-56）布置在至少一个开口（37-47）处，该光源照射开口（37-47），其中一个或 污染物质在穿透开口（37-47）之前可以分解的更多波长。