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公开(公告)号:US20250075855A1
公开(公告)日:2025-03-06
申请号:US18953615
申请日:2024-11-20
Applicant: ENEOS Corporation
Inventor: Akihiko FUKUNAGA , Tatsuya REMBUTSU , Koki SAKAMOTO
Abstract: A control circuit controls fillings speeds of hydrogen gas filling a fuel tank. The control circuit a) receives values of a characteristic of the tank during a process of filling the tank with the hydrogen gas, b) calculates at different times during the filling process the differences between a preset threshold of the characteristic of the tank and the values of the characteristic of the tank received at the different times during the filling process, c) calculates plural filling speeds of the hydrogen gas filling the tank during the filling process, each of the filling speeds depending on one of the plurality of differences between the preset threshold and the values of the characteristic of the tank received at the different times during the filling process, and d) controls an operation of a dispenser for filling the tank with the hydrogen gas at the calculated filling speeds.
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公开(公告)号:US20210003256A1
公开(公告)日:2021-01-07
申请号:US17017132
申请日:2020-09-10
Applicant: ENEOS Corporation
Inventor: Akihiko FUKUNAGA , Toshio TEZUKA , Tatsuya REMBUTSU , Kouki SAKAMOTO
Abstract: According to one aspect of the present invention, a hydrogen fuel filling system includes a first flow passage through which hydrogen fuel supplied from a pressure accumulator that accumulates hydrogen fuel under pressure passes; a second flow passage through which hydrogen fuel supplied from the pressure accumulator passes, and which is arranged in parallel with the first flow passage; a switching valve that switches flow passages selectively from one of the first and second flow passages to another, or that switches flow passages between one and both of the first and second flow passages; and a control circuit that controls opening/closing of the switching valve, wherein a fuel cell vehicle using hydrogen fuel as a power source is filled with hydrogen fuel while switching the flow passages by the switching valve during supply from the pressure accumulator.
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公开(公告)号:US20210062974A1
公开(公告)日:2021-03-04
申请号:US17097439
申请日:2020-11-13
Applicant: ENEOS Corporation
Inventor: Toshio TEZUKA , Tatsuya REMBUTSU , Koki SAKAMOTO
Abstract: According to one aspect of the present invention, a method for diagnosing a failure of a flowmeter in a measuring machine, includes calculating a filling amount at an end of filling of the hydrogen gas into a tank from the measuring machine by using a pressure, a temperature, and a volume of the tank; and determining whether or not the flowmeter fails by using a plurality of error values between a metering filling amount at the end of filling measured using the flowmeter and a calculated filling amount at the end of filling calculated using the pressure, the temperature, and the volume of the tank, the plurality of error values being based on a plurality of past performance data stored in a storage device, and an error value at the end of filling of the hydrogen gas at a present time, and outputting a result.
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公开(公告)号:US20210062973A1
公开(公告)日:2021-03-04
申请号:US17097469
申请日:2020-11-13
Applicant: ENEOS Corporation
Inventor: Akihiko FUKUNAGA , Tatsuya REMBUTSU , Koki SAKAMOTO
Abstract: According to one aspect of the present invention, a hydrogen gas filling method includes receiving, from a vehicle equipped with a tank to be filled with hydrogen gas and powered by the hydrogen gas, a temperature of the tank before a start of filling; calculating a difference between a preset maximum temperature and the temperature of the tank; calculating a filling speed of the hydrogen gas depending on the difference; and filling the hydrogen gas from an accumulator in which the hydrogen gas is accumulated into the tank at the filling speed calculated via a measuring machine.
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公开(公告)号:US20240183496A1
公开(公告)日:2024-06-06
申请号:US18278471
申请日:2022-03-02
Applicant: ENEOS Corporation , Tokico System Solutions, Ltd.
Inventor: Shinji OSHIMA , Tatsuya REMBUTSU
CPC classification number: F17C5/007 , F17C5/06 , F17C13/025 , F17C2221/012 , F17C2223/0123
Abstract: A gas filling device is provided with a first gas supply pipeline, a second gas supply pipeline, and an integrated control panel. The first gas supply pipeline supplies hydrogen gas from a multistage accumulator to a first filled tank mounted on a first vehicle. The second gas supply pipeline supplies hydrogen gas from the multistage accumulator to a second filled tank mounted on a second vehicle different from the first vehicle. At the time of filling the hydrogen gas into both of the first filled tank and the second filled tank from the multistage accumulator, the integrated control panel sets a pressure rise rate of the first filled tank or a pressure rise rate of the second filled tank to be lower than a reference pressure rise rate in accordance with a difference in pressure between the first filled tank and the second filled tank.
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公开(公告)号:US20220260209A1
公开(公告)日:2022-08-18
申请号:US17732049
申请日:2022-04-28
Applicant: ENEOS Corporation
Inventor: Akihiko FUKUNAGA , Tatsuya REMBUTSU , Koki SAKAMOTO
Abstract: A hydrogen gas filling device includes a reception circuit, a difference calculation circuit, a filling speed calculation circuit, an accumulator, and a filing machine. The reception circuit is configured to receive, from a vehicle equipped with a tank to be filled with hydrogen gas and powered by the hydrogen gas, a value of a parameter of the vehicle. The difference calculation circuit is configured to calculate a difference between a predetermined value and the value of the parameter received from the vehicle. The filling speed calculation circuit is configured to calculate a filling speed of the hydrogen gas depending on the difference. The accumulator is configured to accumulate hydrogen gas. The filling machine is configured to fill the tank with the hydrogen gas from the accumulator at the calculated filling speed. A hydrogen gas filling method includes the operations noted above.
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公开(公告)号:US20210239272A1
公开(公告)日:2021-08-05
申请号:US17049172
申请日:2019-04-26
Applicant: ENEOS CORPORATION
Inventor: Tatsuya REMBUTSU , Akihiko FUKUNAGA , Toshio TEZUKA , Eiji NEGISHI
Abstract: A control device of a gas charging device controls opening/closing of a control valve so that pressure increase rate of gas pressure in a tank when gas charging to the tank increases at a reference increase rate determined in advance. The control device, when gas charge to the tank begins, controls pressure increase rate at a high increase rate higher than the reference increase rate. After the difference between gas pressure in the tank when gas charging is performed at the high increase rate and gas pressure in the tank when the charging is performed at the reference increase rate has reached a predetermined pressure difference, the control device controls the opening/closing of the control valve so that gas charge to the tank is performed at the reference increase rate.
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