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公开(公告)号：US20240309272A1
公开(公告)日：2024-09-19
申请号：US18607272
申请日：2024-03-15
Applicant: ENTEGRIS, INC.
Inventor： Juhee Yeo , SeongJin Hong , WonLae Kim , Younghun Park , Yeonhui Kang , Jinwook Jeong
IPC: C09K13/06
CPC classification number: C09K13/06
Abstract: Compositions and methods for selectively etching silicon nitride relative to polysilicon, silicon oxide materials and/or silicide materials from a microelectronic device.
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