公开(公告)号：US20140182674A1

公开(公告)日：2014-07-03

申请号：US14196144

申请日：2014-03-04

Applicant: FUJIFILM Corporation

Inventor： Kohei HIGASHI ,  Yoshiki MAEHARA ,  Jiro TSUKAHARA ,  Yuichi TOMARU

IPC: H05K1/02 ,  H01L31/18 ,  H01L31/0224

CPC classification number: H05K1/0274 ,  G06F2203/04103 ,  H01L31/022466 ,  H01L31/022491 ,  H01L31/1884 ,  H01L51/445 ,  Y02E10/549 ,  Y02P70/521 ,  Y10T29/49155

Abstract: A transparent conductive film includes: a conductive stripe formed on a plastic support by a mask deposition process, the conductive stripe including a plurality of conductive lines made of a metal or an alloy having a film thickness of not less than 50 nm and not greater than 500 nm and a line width of not less than 0.3 mm and not greater than 1 mm in plan view and being arranged at an interval of not less than 3 mm and not greater than 20 mm; and a transparent conductive material layer formed to cover the plastic support and the conductive stripe, the transparent conductive material having a specific resistance of not greater than 4×10−3 Ω·cm and a film thickness of not less than 20 ma and not greater than 500 nm.

Abstract translation: 透明导电膜包括：通过掩模沉积工艺在塑料支撑体上形成的导电条，所述导电条包括多个由金属或合金制成的导电线，所述金属或合金的膜厚度不小于50nm且不大于 500nm，线宽不小于0.3mm，平面图中不大于1mm，并以不小于3mm和不大于20mm的间隔布置; 以及形成为覆盖塑料支撑体和导电条的透明导电材料层，所述透明导电材料的电阻率不大于4×10-3＆OHgr·cm，膜厚度不小于20ma，而不是 大于500nm。