公开(公告)号：US20200152498A1

公开(公告)日：2020-05-14

申请号：US16188814

申请日：2018-11-13

Applicant: GLOBALFOUNDRIES INC.

Inventor： Dongyue Yang ,  Keith H. Tabakman ,  Guanchen He ,  Xintuo Dai ,  Xueli Hao

IPC: H01L21/68 ,  H01L21/033 ,  H01L21/762 ,  H01L23/544

Abstract: Embodiments of the disclosure provides an apparatus for aligning layers of an integrated circuit (IC), the apparatus including: an insulator layer positioned above a semiconductor substrate; a first diffraction grating within a first region of the insulator layer, the first diffraction grating including a first grating material within the first region of the insulator layer; and a second diffraction grating within a second region of the insulator layer, the second grating including a second grating material within the second region of the insulator layer, wherein the second grating material is different from the first grating material, and wherein an optical contrast between the first and second grating materials is greater than an optical contrast between the second grating material and the insulator layer.