公开(公告)号：US10332747B1

公开(公告)日：2019-06-25

申请号：US15878519

申请日：2018-01-24

Applicant: GLOBALFOUNDRIES INC.

Inventor： Koji Watanabe ,  Meng Zhu ,  Brian A. Cohen ,  Matthew T. Whitman ,  Balaji Kannan

IPC: H01L21/8234 ,  H01L21/285 ,  H01L29/49 ,  H01L29/51 ,  C23C16/34 ,  C23C16/455 ,  C23C16/04 ,  H01L21/28

Abstract: In an exemplary method, a dielectric layer is deposited on a substrate. A masking layer is formed over a first region and a second region of the dielectric layer. The masking layer is made of an oxide of lanthanum. The masking layer is removed from the second region of the dielectric layer. A work function layer is formed directly on only the second region of the dielectric layer. The work function layer is made of titanium nitride that is formed by using a combination of titanium tetrachloride and ammonia (TiCl4/NH3).