公开(公告)号：US09443956B2

公开(公告)日：2016-09-13

申请号：US14675880

申请日：2015-04-01

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Hong Yu ,  Biao Zuo ,  Jin Ping Liu ,  Huang Liu

IPC: H01L29/66

CPC classification number: H01L29/6656 ,  H01L29/4991 ,  H01L29/6653 ,  H01L29/66545 ,  H01L29/66795 ,  H01L29/785

Abstract: A method includes forming a line feature above a substrate. Carbon-containing spacers are formed on sidewalls of the line feature. A first dielectric layer is formed above the carbon spacers and the line feature. The first dielectric layer is planarized to expose upper ends of the carbon-containing spacers. An ashing process is performed to remove the carbon-containing spacers and define air gaps adjacent the line feature. A cap layer is formed to seal the upper ends of the air gaps.

Abstract translation: 一种方法包括在衬底上形成线特征。 含碳隔离物形成在线特征的侧壁上。 第一电介质层形成在碳间隔物和线特征之上。 平面化第一介电层以暴露含碳间隔物的上端。 执行灰化处理以除去含碳间隔物并限定与线特征相邻的气隙。 形成盖层以密封气隙的上端。

公开(公告)号：US20160163816A1

公开(公告)日：2016-06-09

申请号：US14675880

申请日：2015-04-01

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Hong Yu ,  Biao Zuo ,  Jin Ping Liu ,  Huang Liu

IPC: H01L29/66

CPC classification number: H01L29/6656 ,  H01L29/4991 ,  H01L29/6653 ,  H01L29/66545 ,  H01L29/66795 ,  H01L29/785

Abstract: A method includes forming a line feature above a substrate. Carbon-containing spacers are formed on sidewalls of the line feature. A first dielectric layer is formed above the carbon spacers and the line feature. The first dielectric layer is planarized to expose upper ends of the carbon-containing spacers. An ashing process is performed to remove the carbon-containing spacers and define air gaps adjacent the line feature. A cap layer is formed to seal the upper ends of the air gaps.

Abstract translation: 一种方法包括在衬底上形成线特征。 含碳隔离物形成在线特征的侧壁上。 第一电介质层形成在碳间隔物和线特征之上。 平面化第一介电层以暴露含碳间隔物的上端。 执行灰化处理以除去含碳间隔物并限定与线特征相邻的气隙。 形成盖层以密封气隙的上端。