DEVICE FOR COATING THE OUTER EDGE OF A SUBSTRATE DURING MICROELECTRONICS MANUFACTURING
    1.
    发明申请
    DEVICE FOR COATING THE OUTER EDGE OF A SUBSTRATE DURING MICROELECTRONICS MANUFACTURING 有权
    用于在微电子制造过程中涂覆基板的外边缘的装置

    公开(公告)号:US20100012024A1

    公开(公告)日:2010-01-21

    申请号:US12505978

    申请日:2009-07-20

    IPC分类号: B05C5/00

    CPC分类号: H01L21/6715 B05C11/08

    摘要: New baffles and methods of using these baffles are provided. The baffles comprise a body having an edge wall configured to direct the flow of a composition against a substrate (e.g., silicon wafer) edge. The edge wall comprises a vertical surface, a curved sidewall coupled to the vertical surface, and a lip coupled to the curved sidewall. A preferred baffle is annular in shape and formed from a synthetic resinous composition. Even more preferably, the baffle is not formed of a metal. The inventive methods comprise positioning the baffle adjacent a substrate during a spin coating process so that the edge wall causes the composition to cover the edges of the substrate and preferably a portion of the back side of the substrate.

    摘要翻译: 提供了新的挡板和使用这些挡板的方法。 挡板包括具有配置成将组合物的流动引向基板(例如,硅晶片)边缘的边缘壁的主体。 边缘壁包括垂直表面,耦合到垂直表面的弯曲侧壁和联接到弯曲侧壁的唇缘。 优选的挡板是环形的,由合成树脂组合物形成。 更优选地,挡板不是由金属形成。 本发明的方法包括在旋转涂覆过程期间将挡板定位在衬底附近,使得边缘壁使得组合物覆盖衬底的边缘,优选地覆盖衬底的背侧的一部分。

    Process and device for coating the outer edge of a substrate during microelectronics manufacture
    2.
    发明授权
    Process and device for coating the outer edge of a substrate during microelectronics manufacture 有权
    在微电子制造期间用于涂覆衬底的外边缘的工艺和装置

    公开(公告)号:US07579044B2

    公开(公告)日:2009-08-25

    申请号:US11268196

    申请日:2005-11-07

    IPC分类号: B05D7/00 B05D3/12

    CPC分类号: H01L21/6715 B05C11/08

    摘要: New baffles and methods of using these baffles are provided. The baffles comprise a body having an edge wall configured to direct the flow of a composition against a substrate (e.g., silicon wafer) edge. The edge wall comprises a vertical surface, a curved sidewall coupled to the vertical surface, and a lip coupled to the curved sidewall. A preferred baffle is annular in shape and formed from a synthetic resinous composition. Even more preferably, the baffle is not formed of a metal. The inventive methods comprise positioning the baffle adjacent a substrate during a spin coating process so that the edge wall causes the composition to cover the edges of the substrate and preferably a portion of the back side of the substrate.

    摘要翻译: 提供了新的挡板和使用这些挡板的方法。 挡板包括具有配置成将组合物的流动引向基板(例如,硅晶片)边缘的边缘壁的主体。 边缘壁包括垂直表面,耦合到垂直表面的弯曲侧壁和联接到弯曲侧壁的唇缘。 优选的挡板是环形的,由合成树脂组合物形成。 更优选地,挡板不是由金属形成。 本发明的方法包括在旋转涂覆过程期间将挡板定位在衬底附近,使得边缘壁使得组合物覆盖衬底的边缘,优选地覆盖衬底的背侧的一部分。

    Device for coating the outer edge of a substrate during microelectronics manufacturing
    3.
    发明授权
    Device for coating the outer edge of a substrate during microelectronics manufacturing 有权
    用于在微电子制造期间涂覆衬底的外边缘的装置

    公开(公告)号:US08408222B2

    公开(公告)日:2013-04-02

    申请号:US12505978

    申请日:2009-07-20

    IPC分类号: B05C11/10

    CPC分类号: H01L21/6715 B05C11/08

    摘要: New baffles and methods of using these baffles are provided. The baffles comprise a body having an edge wall configured to direct the flow of a composition against a substrate (e.g., silicon wafer) edge. The edge wall comprises a vertical surface, a curved sidewall coupled to the vertical surface, and a lip coupled to the curved sidewall. A preferred baffle is annular in shape and formed from a synthetic resinous composition. Even more preferably, the baffle is not formed of a metal. The inventive methods comprise positioning the baffle adjacent a substrate during a spin coating process so that the edge wall causes the composition to cover the edges of the substrate and preferably a portion of the back side of the substrate.

    摘要翻译: 提供了新的挡板和使用这些挡板的方法。 挡板包括具有配置成将组合物的流动引向基板(例如,硅晶片)边缘的边缘壁的主体。 边缘壁包括垂直表面,耦合到垂直表面的弯曲侧壁和联接到弯曲侧壁的唇缘。 优选的挡板是环形的,由合成树脂组合物形成。 更优选地,挡板不是由金属形成。 本发明的方法包括在旋转涂覆过程期间将挡板定位在衬底附近,使得边缘壁使得组合物覆盖衬底的边缘,优选地覆盖衬底的背侧的一部分。

    Fluid transfer system
    4.
    发明授权
    Fluid transfer system 失效
    流体传输系统

    公开(公告)号:US5878767A

    公开(公告)日:1999-03-09

    申请号:US764968

    申请日:1996-12-13

    IPC分类号: B67D7/04 F17C9/00 B65B31/00

    摘要: A system for transferring fluid from a filling reservoir to a receiving tank. The system includes a fluid transfer line for conveying fluid from the filling reservoir outlet to the receiving tank inlet, and couplings for selectively connecting the fluid transfer line to a filling reservoir outlet and a receiving tank inlet. The system further includes a vapor return line for conveying vapor from a receiving tank vent to a filling reservoir inlet to simultaneously prevent pressure from building in the tank and a vacuum from developing in the reservoir as fluid is transferred from the reservoir to the tank, and couplings for selectively connecting the vapor return line to the filling reservoir inlet and the receiving tank vent. In addition, the system includes a portable platform adapted for movement to a position near the filling reservoir and the receiving tank, and a pump mounted on the platform for selectively inducing fluid to travel through the fluid transfer line from the filling reservoir to the receiving tank when the reservoir outlet valve and the tank inlet valve are open. The system also includes a compressed gas source in communication with the fluid transfer line for blowing gas through the line to remove residual fluid from the line to prevent the escape of residual fluid and associated odor from the line when the fluid transfer line couplings are uncoupled from the filling reservoir outlet and the receiving tank inlet.

    摘要翻译: 用于将流体从填充容器传送到接收罐的系统。 该系统包括用于将流体从填充储存器出口输送到接收罐入口的流体输送管线,以及用于选择性地将流体输送管线连接到填充储存器出口和接收罐入口的联接器。 该系统还包括用于将蒸汽从接收罐通气口输送到填充储存器入口的蒸气返回管线,以同时防止压力在罐中建立,并且当流体从储存器转移到罐体时,真空不会在储存器中显影,以及 用于选择性地将蒸汽返回管线连接到填充容器入口和接收罐通气口的联接器。 另外,该系统包括适于移动到靠近填充容器和接收罐的位置的便携式平台,以及安装在平台上的泵,用于选择性地使流体从填充容器移动到流体输送管线至接收罐 当储存器出口阀和储罐入口阀打开时。 该系统还包括与流体输送管线连通的压缩气体源,用于吹送气体通过管线以从管路中除去残余流体,以防止当流体输送管线联接件脱离时从残留流体和相关气味逸出 灌装容器出口和接收罐入口。