Method and apparatus for nanometer-scale focusing and patterning of ultra-low emittance, multi-MeV proton and ion beams from a laser ion diode
    1.
    发明申请
    Method and apparatus for nanometer-scale focusing and patterning of ultra-low emittance, multi-MeV proton and ion beams from a laser ion diode 失效
    用于从激光离子二极管的超低发射率,多MeV质子和离子束的纳米级聚焦和图案化的方法和装置

    公开(公告)号:US20040018700A1

    公开(公告)日:2004-01-29

    申请号:US10361152

    申请日:2003-02-05

    CPC classification number: H01J27/24

    Abstract: Methods and apparatus for focusing proton and ion beams within the profile of the beam envelope of an ultra-low emittance, charge neutralized emission to create a pattern without focusing the entire beam envelope or rastering. In one implementation, a method for use with laser accelerated ion beams comprises the steps: irradiating a surface of a target with pulsed laser irradiation to produce an electron plasma emission on a non-irradiated surface of the target, the electron plasma emission producing an ion beam emission on the non-irradiated surface, the ion beam emission having a beam envelope; and focusing ions of the ion beam emission into a plurality of component beams within the beam envelope as a result of the shape of the non-irradiated surface of the target.

    Abstract translation: 用于将质子和离子束聚焦在超低发射率的电子束包络的轮廓内的电荷中和的发射以产生图案而不聚焦整个束包络或图像。 在一个实施方案中,用于激光加速离子束的方法包括以下步骤:用脉冲激光照射照射靶的表面以在靶的未照射表面上产生电子等离子体发射,产生电离子 在未照射表面上的光束发射,具有光束包围的离子束发射; 并且由于靶的未照射表面的形状,将离子束发射的离子聚焦到束包络内的多个分量光束中。

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