公开(公告)号：US20230317399A1

公开(公告)日：2023-10-05

申请号：US18128405

申请日：2023-03-30

Applicant: Hitachi High-Tech Corporation

Inventor： Toshimasa KAMEDA ,  Tomoyo SASAKI ,  Shunsuke MIZUTANI

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J2237/24528

Abstract: The invention is directed to suppress charge of a region of interest or damage in the region of interest caused by blanking. A charged particle beam device includes: a deflector configured to scan a region of interest with a beam emitted from a beam source; a second deflector configured to retract the beam to outside of the region of interest after scanning the region of interest with the beam; and one or more computer systems including one or more processors configured to execute a program stored in a storage medium, in which the one or more computer systems determine a retraction direction or a retraction position of the beam (Step S402) based on a scanning direction of the beam in the region.