公开(公告)号：US20230317399A1

公开(公告)日：2023-10-05

申请号：US18128405

申请日：2023-03-30

Applicant: Hitachi High-Tech Corporation

Inventor： Toshimasa KAMEDA ,  Tomoyo SASAKI ,  Shunsuke MIZUTANI

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J2237/24528

Abstract: The invention is directed to suppress charge of a region of interest or damage in the region of interest caused by blanking. A charged particle beam device includes: a deflector configured to scan a region of interest with a beam emitted from a beam source; a second deflector configured to retract the beam to outside of the region of interest after scanning the region of interest with the beam; and one or more computer systems including one or more processors configured to execute a program stored in a storage medium, in which the one or more computer systems determine a retraction direction or a retraction position of the beam (Step S402) based on a scanning direction of the beam in the region.

公开(公告)号：US20220415602A1

公开(公告)日：2022-12-29

申请号：US17773897

申请日：2019-12-13

Applicant: Hitachi High-Tech Corporation

Inventor： Tomoyo SASAKI

IPC: H01J37/073 ,  H01J37/28 ,  H01J37/26 ,  H01J37/08

Abstract: The present disclosure provides a charged particle beam device capable of simultaneously achieving protection of a charged particle source against electrical discharging inside a charged particle gun and highly accurate control of the charged particle gun, for both DC and AC components. A charged particle gun according to the present disclosure is configured such that an extraction voltage and an acceleration voltage are superposed and supplied to a charged particle beam source, a wiring between the charged particle beam source and a voltage circuit is covered with first and second enclosures, the first enclosure is configured to be connected to an extraction electrode, and the second enclosure is configured to be connected to an acceleration electrode and to a reference voltage of the voltage circuit.

公开(公告)号：US20230343549A1

公开(公告)日：2023-10-26

申请号：US18027191

申请日：2021-10-26

Applicant: Hitachi High-Tech Corporation

Inventor： Masahiro FUKUTA ,  Tomoyo SASAKI ,  Makoto SUZUKI ,  Masashi WADA ,  Hiroshi NISHIHAMA

IPC: H01J37/147 ,  G01N23/2251 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  G01N23/2251 ,  H01J37/10 ,  H01J37/1474 ,  H01J37/28 ,  G01N2223/505 ,  H01J2237/0492 ,  H01J2237/2443 ,  H01J2237/24495

Abstract: The present invention overcomes a trade-off between throughput, SNR, and spatial resolution in a charged particle beam device. Accordingly, a computer 18 sets at least one of a charged particle optical system and a detection system so as to modulate the intensity of signal charged particles or an electromagnetic wave detected by a detector 12 at a prescribed frequency. The charged particle optical system scans a specimen with a charged particle beam. The computer 18 generates an image or a signal profile by associating an irradiation position of the charged particle beam with a DC component of a signal acquired through synchronous detection of a detection signal from the detector at the irradiation position with a reference signal having a prescribed frequency.

公开(公告)号：US20240014002A1

公开(公告)日：2024-01-11

申请号：US18200232

申请日：2023-05-22

Applicant: Hitachi High-Tech Corporation

Inventor： Takayasu IWATSUKA ,  Hideto DOHI ,  Tomoyo SASAKI ,  Wen LI

IPC: H01J37/244 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/1475 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/24521 ,  H01J2237/24455

Abstract: The charged particle beam apparatus includes a charged particle source generating a charged particle beam, a deflector deflecting the charged particle beam, a detector detecting secondary electrons emitted from an irradiation target in response to irradiation with the charged particle beam, and a processor system. The processor system (A) acquires a first time-series change in secondary electron detection-related quantity by repeatedly performing the following (A1) and (A2), (A1) directly or indirectly, maintains or changes the control amount applied to the deflector to a first control amount, and (A2) acquires the secondary electron detection-related quantity based on an output from the detector, and (B) acquires a time-series change in variation of the beam diameter of the charged particle beam based on the first time-series change.

公开(公告)号：US20230353056A1

公开(公告)日：2023-11-02

申请号：US18016989

申请日：2020-07-22

Applicant: Hitachi High-Tech Corporation

Inventor： Tomoyo SASAKI

IPC: H02M3/28 ,  H02M1/14 ,  H02M1/00 ,  H01J37/248

CPC classification number: H02M3/28 ,  H01J37/248 ,  H02M1/0043 ,  H02M1/14

Abstract: This DC high-voltage source device comprises a first voltage source including: a first variable DC voltage source; a second variable DC voltage source; a first switching circuit that generates an AC voltage from the DC voltage of the first variable DC voltage source; a second switching circuit that generates an AC voltage from the DC voltage of the second variable DC voltage source; a first transformer that transforms the AC voltage generated by the first switching circuit; a second transformer that transforms the AC voltage generated by the second switching circuit; a DC high-voltage generation circuit that generates a DC high voltage on the basis of a transformed AC voltage supplied from the first transformer and a transformed AC voltage supplied from the second transformer; and a computer system. The computer system independently adjusts the DC voltage value of the first variable DC voltage source, the DC voltage value of the second variable DC voltage source, the switching timing of the first switching circuit, and the switching timing of the second switching circuit.

公开(公告)号：US20230010272A1

公开(公告)日：2023-01-12

申请号：US17783788

申请日：2019-12-16

Applicant: Hitachi High-Tech Corporation

Inventor： Shinichi MURAKAMI ,  Tomoyo SASAKI ,  Yuuji KASAI ,  Yuzuru MIZUHARA ,  Wen LI

IPC: H01J37/04 ,  H01J37/28 ,  H01J37/24

Abstract: Provided is a charged particle beam device with low blanking noise and improved signal detection accuracy. As means therefor, a charged particle beam device is configured by: a stage where a sample is mountable; a charged particle gun performing charged particle emission to the sample; a voltage source; a first switching circuit to which a voltage is supplied from the voltage source; a second switching circuit having one end connected to a ground; a third switching circuit having one end connected to the ground; a fourth switching circuit to which a voltage is supplied from the voltage source; a first blanking electrode connected to the first switching circuit and the second switching circuit; a second blanking electrode facing the first blanking electrode and connected to the third switching circuit and the fourth switching circuit; and a control circuit controlling the first switching circuit, the second switching circuit, the third switching circuit, and the fourth switching circuit.