公开(公告)号：US20230317399A1

公开(公告)日：2023-10-05

申请号：US18128405

申请日：2023-03-30

Applicant: Hitachi High-Tech Corporation

Inventor： Toshimasa KAMEDA ,  Tomoyo SASAKI ,  Shunsuke MIZUTANI

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J2237/24528

Abstract: The invention is directed to suppress charge of a region of interest or damage in the region of interest caused by blanking. A charged particle beam device includes: a deflector configured to scan a region of interest with a beam emitted from a beam source; a second deflector configured to retract the beam to outside of the region of interest after scanning the region of interest with the beam; and one or more computer systems including one or more processors configured to execute a program stored in a storage medium, in which the one or more computer systems determine a retraction direction or a retraction position of the beam (Step S402) based on a scanning direction of the beam in the region.

公开(公告)号：US20230290606A1

公开(公告)日：2023-09-14

申请号：US18013952

申请日：2020-07-07

Applicant: Hitachi High-Tech Corporation

Inventor： Yusuke ABE ,  Yusuke NAKAMURA ,  Shunsuke MIZUTANI ,  Muneyuki FUKUDA

IPC: H01J37/147 ,  H01J37/14 ,  H01J37/24 ,  H01J37/244

CPC classification number: H01J37/147 ,  H01J37/14 ,  H01J37/241 ,  H01J37/244

Abstract: Provided is a charged particle beam device that can impart a function of an energy filter to even a small BSE detector. The charged particle beam device includes a fluorescent substance that converts charged particles generated by irradiation of a sample with a charged particle beam into light; a detector that detects the light emitted from the fluorescent substance; a light guide element for guiding the light from the fluorescent substance to the detector; a light amount adjuster that adjusts the amount of light that is received by the detector through the fluorescent substance and the light guide element; and a control unit that controls the light amount adjuster.

公开(公告)号：US20230030651A1

公开(公告)日：2023-02-02

申请号：US17962915

申请日：2022-10-10

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Yoshifumi SEKIGUCHI ,  Shin IMAMURA ,  Shunsuke MIZUTANI ,  Shahedul HOQUE ,  Uki IKEDA

IPC: H01J37/244 ,  G01N23/2251 ,  G02B6/42

Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.

公开(公告)号：US20210183614A1

公开(公告)日：2021-06-17

申请号：US17269424

申请日：2018-09-21

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Yoshifumi SEKIGUCHI ,  Shin IMAMURA ,  Shunsuke MIZUTANI ,  Shahedul HOQUE ,  Uki IKEDA

IPC: H01J37/244 ,  G02B6/42 ,  G01N23/2251

Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.

公开(公告)号：US20220246392A1

公开(公告)日：2022-08-04

申请号：US17587935

申请日：2022-01-28

Applicant: Hitachi High-Tech Corporation

Inventor： Akio YAMAMOTO ,  Wen LI ,  Hiroshi OINUMA ,  Shunsuke MIZUTANI

IPC: H01J37/244 ,  H01J37/28 ,  H01J37/26 ,  H01J37/22

Abstract: Provided is a charged particle beam device and a charged particle beam device calibration method capable of correcting an influence of characteristic variation and noise with high accuracy. Control units execute a first calibration of correcting a characteristic variation between a plurality of channels in detectors and signal processing circuits by using a setting value of a control parameter for each of the plurality of channels in a state in which a primary electron beam is not emitted. The control units further execute a second calibration of correcting a characteristic variation between the plurality of channels in scintillators or the like by using the setting value of the control parameter for each of the plurality of channels in a state in which the primary electron beam is emitted.

公开(公告)号：US20220244412A1

公开(公告)日：2022-08-04

申请号：US17617277

申请日：2019-07-10

Applicant: Hitachi High-Tech Corporation

Inventor： Eri TAKAHASHI ,  Shin IMAMURA ,  Makoto SUZUKI ,  Shunsuke MIZUTANI

IPC: G01T1/202 ,  H01J49/02 ,  H01J37/244

Abstract: The purpose of the present invention is to provide a scintillator for a charged particle beam device and a charged particle beam device which achieve both an increase in emission intensity and a reduction in afterglow intensity. This scintillator for a charged particle beam device is characterized by comprising a substrate (13), a buffer layer (14) formed on a surface of the substrate (13), a stack (12) of a light emitting layer (15) and a barrier layer (16) formed on a surface of the buffer layer (14), and a conductive layer (17) formed on a surface of the stack (12) and by being configured such that the light emitting layer (15) contains InGaN, the barrier layer (16) contains GaN, and the ratio b/a of the thickness b of the barrier layer (16) to the thickness a of the light emitting layer (15) is 11 to 25.

公开(公告)号：US20230335373A1

公开(公告)日：2023-10-19

申请号：US18131891

申请日：2023-04-07

Applicant: Hitachi High-Tech Corporation

Inventor： Akio YAMAMOTO ,  Wen LI ,  Shunsuke MIZUTANI ,  Naoya ISHIGAKI

IPC: H01J37/244 ,  H01J37/28 ,  H01J37/26

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J37/265 ,  H01J2237/24475 ,  H01J2237/2448

Abstract: There is provided a technique capable of reducing deterioration of a back scattered electron (BSE) detector caused by a dark pulse. Charged particle beam apparatus includes: a plurality of BSE detectors configured to detect a BSE from a sample; and a controller. The controller acquires, within a period, a first peak time of a first peak included in an output signal from a first BSE detector among the plurality of BSE detectors, and a second peak time of a second peak included in an output signal from a second BSE detector other than the first BSE detector among the plurality of BSE detectors, determines, when the second peak is present where a time difference between the first peak time and the second peak time is within a threshold value, that the first peak is caused by the BSE, and determines, when the second peak is not present where the time difference is within the threshold value, that the first peak is caused by the dark pulse.

公开(公告)号：US20230184704A1

公开(公告)日：2023-06-15

申请号：US17923662

申请日：2020-06-10

Applicant: Hitachi High-Tech Corporation

Inventor： Eri TAKAHASHI ,  Shin IMAMURA ,  Makoto SUZUKI ,  Shunsuke MIZUTANI

IPC: G01N23/2251 ,  G01T1/20

CPC classification number: G01N23/2251 ,  G01T1/2018 ,  G01N2223/505 ,  G01N2223/07 ,  G01N2223/20

Abstract: The present invention provides: a scintillator which is reduced in the intensity of the afterglow, while having increased luminous intensity; and a charged particle radiation apparatus. A scintillator according to the present invention is characterized in that: a base material, a buffer layer, a light emitting part and a first conductive layer are sequentially stacked in this order; the light emitting part contains one or more elements that are selected from the group consisting of Ga, Zn, In, Al, Cd, Mg, Ca and Sr; and a second conductive layer is provided between the base material and the light emitting part.

公开(公告)号：US20210404801A1

公开(公告)日：2021-12-30

申请号：US17290018

申请日：2018-11-05

Applicant: Hitachi High-Tech Corporation

Inventor： Ayumi DOI ,  Makoto SUZUKI ,  Daisuke BIZEN ,  Shunsuke MIZUTANI

IPC: G01B21/18 ,  H01J37/28 ,  G01B15/04

Abstract: The present disclosure pertains to a method, a system, and a computer-readable medium for highly precisely measuring the depth of a recess formed in a sample even when, inter alia, the material or pattern density of the sample differs. In order to achieve the purpose described above, there are proposed a method, a measurement system, and a non-temporary computer-readable medium for storing program commands that can be executed by a computer system, the method, system, and medium involving: using a measurement tool to acquire an image or a brightness distribution of a region including a recess formed in a sample; extracting a first characteristic of the interior of the recess, and a second characteristic pertaining to the dimensions or area of the recess, from the acquired image or brightness distribution; and inputting the extracted first characteristic and second characteristic to a model that indicates the relationship between the first characteristic, the second characteristic, and a depth index of the recess to thereby derive the depth index of the recess.

公开(公告)号：US20210375583A1

公开(公告)日：2021-12-02

申请号：US17394925

申请日：2021-08-05

Applicant: Hitachi High-Tech Corporation

Inventor： Shunsuke MIZUTANI ,  Shahedul HOQUE ,  Uki IKEDA ,  Makoto SUZUKI

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/244

Abstract: A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.