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1.发明授权Method and apparatus for reverse sputtering selected electrically exposed areas of a cathodically biased workpiece 失效用于反向溅射阴极偏压工件的选择的电暴露区域的方法和装置
公开(公告)号：US3410774A
公开(公告)日：1968-11-12
申请号：US50298665
申请日：1965-10-23
Applicant: IBM
Inventor： FRED BARSON , JOHANN STURM
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