公开(公告)号：US20200325072A1

公开(公告)日：2020-10-15

申请号：US16096641

申请日：2017-04-26

Applicant: IDEMITSU KOSAN CO., LTD.

Inventor： Kazuyoshi INOUE ,  Futoshi UTSUNO ,  Shigekazu TOMAI ,  Masatoshi SHIBATA ,  Mami ITOSE

IPC: C04B35/01 ,  C04B35/626 ,  C04B35/64 ,  C23C14/34 ,  C23C14/08 ,  H01L21/02 ,  H01L27/12 ,  H01L29/24 ,  H01L29/786

Abstract: An oxide sintered body is characterized in that it comprises an oxide including an In element, a Zn element, a Sn element and a Y element and that a sintered body density is equal to or more than 100.00% of a theoretical density.

公开(公告)号：US20200235247A1

公开(公告)日：2020-07-23

申请号：US16634855

申请日：2018-08-01

Applicant: IDEMITSU KOSAN CO.,LTD.

Inventor： Masashi OYAMA ,  Mami ITOSE

IPC: H01L29/786 ,  H01L29/66 ,  H01L21/02 ,  H01L29/24 ,  C23C14/34 ,  C23C14/08

Abstract: A sputtering target contains an oxide sinter that contains indium (In) element, tin element (Sn), zinc element (Zn), X element and oxygen, that further contains a spinel structure compound represented by Zn2SnO4, and that satisfies a formula (1) representing an atomic ratio of the elements. 0.001≤X/(In+Sn+Zn+X)≤0.05  (1) In the formula (1), In, Zn, Sn, and X represent contents of the In element, Zn element, Sn element, and X element in the oxide sinter, respectively, and the X element is at least one element selected from Ge, Si, Y, Zr, Al, Mg, Yb and Ga.

公开(公告)号：US20210355033A1

公开(公告)日：2021-11-18

申请号：US17358411

申请日：2021-06-25

Applicant: IDEMITSU KOSAN CO., LTD.

Inventor： Kazuyoshi INOUE ,  Futoshi UTSUNO ,  Shigekazu TOMAI ,  Masatoshi SHIBATA ,  Mami ITOSE

IPC: C04B35/01 ,  C04B35/626 ,  C04B35/64 ,  C23C14/08 ,  C23C14/34 ,  H01L21/02 ,  H01L27/12 ,  H01L29/24 ,  H01L29/786

Abstract: An oxide sintered body is characterized in that it comprises an oxide including an In element, a Zn element, a Sn element and a Y element and that a sintered body density is equal to or more than 100.00% of a theoretical density.