公开(公告)号：US20200235247A1

公开(公告)日：2020-07-23

申请号：US16634855

申请日：2018-08-01

Applicant: IDEMITSU KOSAN CO.,LTD.

Inventor： Masashi OYAMA ,  Mami ITOSE

IPC: H01L29/786 ,  H01L29/66 ,  H01L21/02 ,  H01L29/24 ,  C23C14/34 ,  C23C14/08

Abstract: A sputtering target contains an oxide sinter that contains indium (In) element, tin element (Sn), zinc element (Zn), X element and oxygen, that further contains a spinel structure compound represented by Zn2SnO4, and that satisfies a formula (1) representing an atomic ratio of the elements. 0.001≤X/(In+Sn+Zn+X)≤0.05  (1) In the formula (1), In, Zn, Sn, and X represent contents of the In element, Zn element, Sn element, and X element in the oxide sinter, respectively, and the X element is at least one element selected from Ge, Si, Y, Zr, Al, Mg, Yb and Ga.

公开(公告)号：US20220002205A1

公开(公告)日：2022-01-06

申请号：US17289975

申请日：2019-10-30

Applicant: IDEMITSU KOSAN CO.,LTD.

Inventor： Shigekazu TOMAI ,  Yoshihiro UEOKA ,  Satoshi KATSUMATA ,  Kenichi SASAKI ,  Masashi OYAMA

IPC: C04B35/453

Abstract: A sintered body, containing zinc, magnesium and oxygen as constituent elements, wherein the atomic ratio of zinc to the sum of zinc and magnesium [Zn/(Zn+Mg)] is 0.20 to 0.75, the atomic ratio of magnesium to the sum of zinc and magnesium [Mg/(Zn+Mg)] is 0.25 to 0.80, and the sintered body consists of a single crystal structure as measured by X-ray diffraction.

公开(公告)号：US20220199784A1

公开(公告)日：2022-06-23

申请号：US17598817

申请日：2020-03-26

Applicant: IDEMITSU KOSAN CO., LTD.

Inventor： Emi KAWASHIMA ,  Kazuyoshi INOUE ,  Masashi OYAMA ,  Masatoshi SHIBATA

IPC: H01L29/24 ,  H01L29/04 ,  H01L29/786 ,  H01L29/66

Abstract: A crystalline oxide thin film contains an In element, a Ga element and an Ln element, in which the In element is a main component, the Ln element is at least one element selected from the group consisting of La, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu, and an average crystal grain size D1 is in a range from 0.05 μm to 0.5 μm.