公开(公告)号：US12259660B2

公开(公告)日：2025-03-25

申请号：US17676534

申请日：2022-02-21

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Cheng-Hsien Chen ,  Shu-Chun Liao ,  Shau-Wei Hsu ,  Wei-En Fu ,  Tsung-Ying Chung ,  Yi-Chen Chuang

IPC: G03F7/00 ,  G01J1/42

Abstract: An inspection method and an inspection platform applicable for inspecting a light source used to expose a substrate. The light source is adapted to form an illuminated area on a surface of the substrate. The inspection method includes the following steps: placing at least one inspection component on the surface of the substrate; causing the at least one inspection component and the illuminated area to have a relative movement and a relative speed in a specific direction so as to make the illuminated area move across the at least one inspection component, wherein in the specific direction, the illuminated area is smaller in size than the at least one inspection component; inspecting photon energy of incident light in the illuminated area by the at least one inspection component during the relative movement; and determining optical values of the light source according to the photon energy and the relative speed.