公开(公告)号：US20200033736A1

公开(公告)日：2020-01-30

申请号：US16045253

申请日：2018-07-25

Applicant: Intel Corporation

Inventor： Robert BRISTOL ,  Guojing ZHANG ,  Tristan TRONIC ,  John MAGANA ,  Chang Ju CHOI ,  Arvind SUNDARAMURTHY ,  Richard SCHENKER

IPC: G03F7/20 ,  G03F1/24

Abstract: Embodiments described herein comprise extreme ultraviolet (EUV) reticles and methods of forming EUV reticles. In an embodiment, the reticle may comprise a substrate and a mirror layer over the substrate. In an embodiment, the mirror layer comprises a plurality of alternating first mirror layers and second mirror layers. In an embodiment, a phase-shift layer is formed over the mirror layer. In an embodiment, openings for printable features and openings for non-printable features are formed into the phase-shift layer. In an embodiment, the non-printable features have a dimension that is smaller than a dimension of the printable features.