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公开(公告)号：US10656511B2
公开(公告)日：2020-05-19
申请号：US16403313
申请日：2019-05-03
Applicant: Intel Corporation
Inventor： Anders Grunnet-Jepsen , John Sweetser , Akihiro Takagi , Paul Winer , John Woodfill
IPC: G03B21/20 , H04N5/74 , G03B21/00 , G02B27/09 , G06T7/521 , H04N9/31 , G03B17/54 , G01B11/25 , G03B35/00
Abstract: A light pattern projector with a pattern mask to spatially modulate an intensity of a wideband illumination source, such as an LED, and a projector lens to reimage the spatially modulated emission onto regions of a scene that is to be captured with an image sensor. The projector lens may comprise a microlens array (MLA) including a first lenslet to reimage the spatially modulated emission onto a first portion of a scene, and a second lenslet to reimage the spatially modulated emission onto a first portion of a scene. The MLA may have a fly's eye architecture with convex curvature over a diameter of the projector lens in addition to the lenslet curvature. The pattern mask may be an amplitude mask comprising a mask pattern of high and low amplitude transmittance regions. In the alternative, the pattern mask may be a phase mask, such as a refractive or diffractive mask.
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公开(公告)号：US10310362B2
公开(公告)日：2019-06-04
申请号：US16024024
申请日：2018-06-29
Applicant: Intel Corporation
Inventor： Anders Grunnet-Jepsen , John Sweetser , Akihiro Takagi , Paul Winer , John Woodfill
Abstract: A light pattern projector with a pattern mask to spatially modulate an intensity of a wideband illumination source, such as an LED, and a projector lens to reimage the spatially modulated emission onto regions of a scene that is to be captured with an image sensor. The projector lens may comprise a microlens array (MLA) including a first lenslet to reimage the spatially modulated emission onto a first portion of a scene, and a second lenslet to reimage the spatially modulated emission onto a first portion of a scene. The MLA may have a fly's eye architecture with convex curvature over a diameter of the projector lens in addition to the lenslet curvature. The pattern mask may be an amplitude mask comprising a mask pattern of high and low amplitude transmittance regions. In the alternative, the pattern mask may be a phase mask, such as a refractive or diffractive mask.
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公开(公告)号：US20200004126A1
公开(公告)日：2020-01-02
申请号：US16403313
申请日：2019-05-03
Applicant: Intel Corporation
Inventor： Anders Grunnet-Jepsen , John Sweetser , Akihiro Takagi , Paul Winer , John Woodfill
Abstract: A light pattern projector with a pattern mask to spatially modulate an intensity of a wideband illumination source, such as an LED, and a projector lens to reimage the spatially modulated emission onto regions of a scene that is to be captured with an image sensor. The projector lens may comprise a microlens array (MLA) including a first lenslet to reimage the spatially modulated emission onto a first portion of a scene, and a second lenslet to reimage the spatially modulated emission onto a first portion of a scene. The MLA may have a fly's eye architecture with convex curvature over a diameter of the projector lens in addition to the lenslet curvature. The pattern mask may be an amplitude mask comprising a mask pattern of high and low amplitude transmittance regions. In the alternative, the pattern mask may be a phase mask, such as a refractive or diffractive mask.
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公开(公告)号：US20190041736A1
公开(公告)日：2019-02-07
申请号：US16024024
申请日：2018-06-29
Applicant: Intel Corporation
Inventor： Anders Grunnet-Jepsen , John Sweetser , Akihiro Takagi , Paul Winer , John Woodfill
Abstract: A light pattern projector with a pattern mask to spatially modulate an intensity of a wideband illumination source, such as an LED, and a projector lens to reimage the spatially modulated emission onto regions of a scene that is to be captured with an image sensor. The projector lens may comprise a microlens array (MLA) including a first lenslet to reimage the spatially modulated emission onto a first portion of a scene, and a second lenslet to reimage the spatially modulated emission onto a first portion of a scene. The MLA may have a fly's eye architecture with convex curvature over a diameter of the projector lens in addition to the lenslet curvature. The pattern mask may be an amplitude mask comprising a mask pattern of high and low amplitude transmittance regions. In the alternative, the pattern mask may be a phase mask, such as a refractive or diffractive mask.
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