公开(公告)号：US09518865B2

公开(公告)日：2016-12-13

申请号：US14471314

申请日：2014-08-28

Applicant: JENOPTIK Optical Systems GmbH

Inventor： Tobias Gnausch ,  Meik Panitz ,  Ralf Mueller ,  Marc Himel

IPC: G01N21/33 ,  G01J1/42 ,  G01J1/04

CPC classification number: G01J1/4257 ,  G01J1/0407 ,  G01J1/429

Abstract: A device and method for measuring a power density distribution of a radiation source is provided. The device includes a radiation source designed to emit a light beam in a radiation direction; a substrate disposed downstream of the radiation source in the radiation direction and having an extent in an x-direction and a y-direction, the substrate having a first region and at least one further second region, and the first region comprises a diffractive structure designed to separate the light beam impinging on the substrate into a zeroth order of diffraction and at least one first order of diffraction; and a detector unit disposed downstream of the substrate in the radiation direction and designed to measure the intensity of the first order of diffraction transmitted through the substrate and to derive a power density distribution therefrom.

Abstract translation: 提供了一种用于测量辐射源的功率密度分布的装置和方法。 该装置包括设计成沿辐射方向发射光束的辐射源; 衬底，其设置在所述辐射源的所述辐射源的下游并具有x方向和y方向的范围，所述衬底具有第一区域和至少一个另外的第二区域，并且所述第一区域包括设计的衍射结构 将入射到基板上的光束分离成零级衍射和至少一个衍射级; 以及检测器单元，其沿辐射方向设置在所述基板的下游，并且被设计成测量透过所述基板的一阶衍射的强度并从其导出功率密度分布。