公开(公告)号：US11894229B2

公开(公告)日：2024-02-06

申请号：US17375445

申请日：2021-07-14

申请人： JSW AKTINA SYSTEM CO., LTD.

发明人： Kenichi Ohmori ,  Suk-Hwan Chung ,  Ryosuke Sato ,  Nobuo Oku

IPC分类号： H01L21/02 ,  B23K26/03 ,  H01L21/268

CPC分类号： H01L21/02675 ,  B23K26/032 ,  H01L21/268

摘要： A laser annealing apparatus according to an embodiment includes a laser light source, an annealing optical system, a linear irradiation region along a Y-direction, a moving mechanism configured to change a relative position of the irradiation region with respect to the substrate along an X-direction, an illumination light source configured to generate illumination light for illuminating the substrate along a third direction, and a detector configured to detect detection light reflected, in a fourth direction, on the substrate illuminated by the illumination light so as to photograph an annealed part of the substrate in a linear field of view along the Y-direction. In a YZ-plane view, the third direction is inclined from the vertical direction and the fourth direction is inclined from the vertical direction.

公开(公告)号：US20230006408A1

公开(公告)日：2023-01-05

申请号：US17747204

申请日：2022-05-18

申请人： JSW Aktina System Co., Ltd.

发明人： Kenichi Ohmori ,  Yuzaburo Ohta ,  Rei Matsushita ,  Nobuo Oku

IPC分类号： H01S3/00 ,  G02F1/01

摘要： A laser irradiation apparatus is a laser irradiation apparatus including a plurality of laser light sources, the laser irradiation apparatus including a control unit configured to perform control with regard to laser emitted from the plurality of laser light sources, in which the control unit acquires characteristic information of each of the plurality of laser light sources, and performs a predetermined process according to each piece of acquired characteristic information.