专利检索 ap:("Jean-Luc Truche" OR "Antonius A. van de Goor" OR "Steven Mark Hoppe, Jr." OR "Frederick Robert Ley") AND inv:"Frederick Robert Ley" 第 1 页

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发明授权
Laser alignment for ion source 有权
标题翻译：离子源的激光对准

公开(公告)号：US07262841B2

公开(公告)日：2007-08-28

申请号：US11083236

申请日：2005-03-17

申请人： Jean-Luc Truche , Antonius A. van de Goor , Steven Mark Hoppe, Jr. , Frederick Robert Ley

发明人： Jean-Luc Truche , Antonius A. van de Goor , Steven Mark Hoppe, Jr. , Frederick Robert Ley

IPC分类号： G01B11/26

CPC分类号： G01B11/27 , H01J49/0418 , H01J49/164

摘要： An apparatus and method for aligning a laser beam in an ion source. A mounting member has a first end, a second end, and an axis. An awl is positioned on the axis and operably connected to the first end. A biasing member is arranged to urge the awl along the axis when the apparatus is mounted on the ion source to create a mark for aligning the laser beam.

摘要翻译： 用于对准离子源中的激光束的装置和方法。安装构件具有第一端，第二端和轴。锥体位于轴上并且可操作地连接到第一端。偏置构件布置成当装置安装在离子源上时沿着轴推动锥形以产生用于对准激光束的标记。