Substrate treatment apparatus
    1.
    发明申请
    Substrate treatment apparatus 审中-公开
    基板处理装置

    公开(公告)号:US20070240646A1

    公开(公告)日:2007-10-18

    申请号:US11783689

    申请日:2007-04-11

    Applicant: Jong-Jin Jun

    Inventor: Jong-Jin Jun

    CPC classification number: H01L21/68742 H01J37/32431

    Abstract: The present invention relates to a substrate treatment apparatus, and more particularly, to a substrate treatment apparatus, wherein lift pins can be installed while the levels of the lift pins are easily adjusted using a tool such as a wrench. A substrate treatment apparatus of the present invention comprises a chamber; a pin plate provided inside or outside the chamber; a driving means for lifting or lowering the pin plate; and at least one lift pin that penetrates through the pin plate so that the lift pin is coupled to the pin plate, and has a tool insertion recess formed at a lower end of the lift pin.

    Abstract translation: 本发明涉及一种基板处理装置,更具体地,涉及一种基板处理装置,其中可以使用诸如扳手的工具容易地调节提升销的水平面而安装提升销。 本发明的基板处理装置包括:室; 设置在室内或室外的销板; 用于提升或降低销板的驱动装置; 以及至少一个提升销,其穿过所述销板,使得所述提升销联接到所述销板,并且具有形成在所述提升销的下端处的工具插入凹部。

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