公开(公告)号：US09851643B2

公开(公告)日：2017-12-26

申请号：US13791470

申请日：2013-03-08

Applicant: KLA-Tencor Corporation

Inventor： Francis Charles Chilese ,  Ulrich Pohlmann ,  Detlef Wolter ,  Joseph Fleming Walsh

IPC: G03F1/84 ,  G03F7/20 ,  B25J11/00

CPC classification number: G03F7/70691 ,  B25J11/0095 ,  G03F1/84 ,  G03F7/70741

Abstract: Systems and methods to control particle generation in a reticle inspection system are presented. The number of particles added to a reticle during an entire load-inspect-unload sequence of a reticle inspection system is reduced by performing all reticle contact events in a controlled, flowing air environment. In one embodiment, the reticle is fixed to a carrier by clamping outside of the vacuum environment, and the carrier, rather than the reticle, is coupled to the reticle stage of the inspection system. In this manner, the high levels of back-side particulation associated with electrostatic chucking are avoided. In addition, the carrier is configured to be coupled to the reticle stage in any of four different orientations separated by ninety degrees.

公开(公告)号：US20130255407A1

公开(公告)日：2013-10-03

申请号：US13791470

申请日：2013-03-08

Applicant: KLA-TENCOR CORPORATION

Inventor： Francis Charles Chilese ,  Ulrich Pohlmann ,  Detlef Wolter ,  Joseph Fleming Walsh

IPC: G03F7/20 ,  B25J11/00

CPC classification number: G03F7/70691 ,  B25J11/0095 ,  G03F1/84 ,  G03F7/70741

Abstract: Systems and methods to control particle generation in a reticle inspection system are presented. The number of particles added to a reticle during an entire load-inspect-unload sequence of a reticle inspection system is reduced by performing all reticle contact events in a controlled, flowing air environment. In one embodiment, the reticle is fixed to a carrier by clamping outside of the vacuum environment, and the carrier, rather than the reticle, is coupled to the reticle stage of the inspection system. In this manner, the high levels of back-side particulation associated with electrostatic chucking are avoided. In addition, the carrier is configured to be coupled to the reticle stage in any of four different orientations separated by ninety degrees.

Abstract translation: 介绍了在掩模版检测系统中控制粒子产生的系统和方法。 通过在受控流动的空气环境中进行所有的掩模版接触事件，减少了在光罩检查系统的整个负载检查 - 卸载顺序期间添加到掩模版的颗粒数。 在一个实施例中，通过夹在真空环境之外将掩模版固定到载体上，并且载体而不是掩模版被耦合到检查系统的掩模版平台。 以这种方式，避免了与静电吸附相关的高水平的背面微粒。 另外，载体被配置成以分开九十度的四个不同取向中的任何一个耦合到标线片台。