Block-to-Block Reticle Inspection
    2.
    发明申请
    Block-to-Block Reticle Inspection 有权
    块到块标线检查

    公开(公告)号:US20150078650A1

    公开(公告)日:2015-03-19

    申请号:US14466688

    申请日:2014-08-22

    Abstract: Block-to-block reticle inspection includes acquiring a swath image of a portion of a reticle with a reticle inspection sub-system, identifying a first occurrence of a block in the swatch image and at least a second occurrence of the block in the swath image substantially similar to the first occurrence of the block and determining at least one of a location, one or more geometrical characteristics of the block and a spatial offset between the first occurrence of the block and the at least a second occurrence of the block.

    Abstract translation: 块对块掩模版检查包括用掩模版检查子系统获取掩模版的一部分的条带图像,识别样本图像中的块的第一次出现以及条纹图像中的块的至少第二次出现 基本上类似于块的第一次出现并且确定块的位置,一个或多个几何特征和块的第一次出现与块的至少第二次出现之间的空间偏移中的至少一个。

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