公开(公告)号：US20200271595A1

公开(公告)日：2020-08-27

申请号：US16283690

申请日：2019-02-22

Applicant: KLA-Tencor Corporation

Inventor： Aaron J. Rosenberg ,  Jonathan Iloreta ,  Thaddeus G. Dziura ,  Antonio Gellineau ,  Yin Xu ,  Kaiwen Xu ,  John Hench ,  Abhi Gunde ,  Andrei Veldman ,  Liequan Lee ,  Houssam Chouaib

IPC: G01N21/95 ,  G06F17/50 ,  H01L27/02 ,  H01L27/088 ,  H01L27/108 ,  H01L27/115 ,  G06T17/10 ,  G06T15/20 ,  G01N21/956

Abstract: A semiconductor metrology tool inspects an area of a semiconductor wafer. The inspected area includes a plurality of instances of a 3D semiconductor structure arranged periodically in at least one dimension. A computer system generates a model of a respective instance of the 3D semiconductor structure based on measurements collected during the inspection. The computer system renders an image of the model that shows a 3D shape of the model and provides the image to a device for display.

公开(公告)号：US10794839B2

公开(公告)日：2020-10-06

申请号：US16283690

申请日：2019-02-22

Applicant: KLA-Tencor Corporation

Inventor： Aaron J. Rosenberg ,  Jonathan Iloreta ,  Thaddeus G. Dziura ,  Antonio Gellineau ,  Yin Xu ,  Kaiwen Xu ,  John Hench ,  Abhi Gunde ,  Andrei Veldman ,  Liequan Lee ,  Houssam Chouaib

IPC: G01N21/00 ,  G01N21/95 ,  H01L27/02 ,  H01L27/088 ,  H01L27/108 ,  G06T17/10 ,  G06T15/20 ,  G01N21/956 ,  H01L27/115 ,  G06F30/39

Abstract: A semiconductor metrology tool inspects an area of a semiconductor wafer. The inspected area includes a plurality of instances of a 3D semiconductor structure arranged periodically in at least one dimension. A computer system generates a model of a respective instance of the 3D semiconductor structure based on measurements collected during the inspection. The computer system renders an image of the model that shows a 3D shape of the model and provides the image to a device for display.