公开(公告)号：US11896694B2

公开(公告)日：2024-02-13

申请号：US17140567

申请日：2021-01-04

Applicant: L'OREAL

Inventor： Aline Aude Guimont ,  Chunhua Li ,  Hubert Tunchiao Lam ,  Derek James Henry

IPC: A61Q3/04 ,  A61K8/34 ,  A61K8/49 ,  A61K8/60 ,  A61K8/81

CPC classification number: A61K8/345 ,  A61K8/34 ,  A61K8/4973 ,  A61K8/60 ,  A61K8/8152 ,  A61K8/8158 ,  A61Q3/04 ,  A61K2800/28 ,  A61K2800/30 ,  A61K2800/31 ,  A61K2800/48

Abstract: The invention relates to compositions for removing nail polish comprising at least at least about 10% by weight of at least one polyhydric alcohol compound, at least one low carbon alcohol, at least one high boiling point ester compound, at least one thickening agent, and at least one abrasive compound, as well as to methods of removing nail polish from nails using such compositions.

公开(公告)号：US11517774B2

公开(公告)日：2022-12-06

申请号：US17095261

申请日：2020-11-11

Applicant: L'OREAL

Inventor： Andrea E. Schott ,  Aline Aude Guimont

IPC: A61Q3/04 ,  A61K8/35 ,  A61K8/34 ,  A61K8/04 ,  A61K8/06 ,  A61K8/37

Abstract: The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.

公开(公告)号：US20190159985A1

公开(公告)日：2019-05-30

申请号：US16175180

申请日：2018-10-30

Applicant: L'OREAL

Inventor： Aline Aude Guimont ,  Chunhua LI

IPC: A61K8/34 ,  A61Q3/04 ,  A61K8/37

Abstract: The invention relates to compositions for removing nail polish including at least about 20% by weight of a C2-C3 monoalcohol, at least about 10% by weight of glycerin, and a diester of a dicarboxylic acid. The compositions optionally include water. The water, if present, is present in a concentration by weight that is less than the concentration by weight of glycerin. If the concentration of glycerin is from 30% to 60% by weight, then the concentration of C2-C3 monoalcohol is at least about 30% by weight.

公开(公告)号：US20240065359A1

公开(公告)日：2024-02-29

申请号：US17823412

申请日：2022-08-30

Applicant: L'Oreal

Inventor： William Robert Bickford ,  Yingchao Chen ,  Francesca D. Cruz ,  Sylvie Poret-Fristot ,  Aline Aude Guimont ,  Karin Kaskiel ,  Chunhua Li

IPC: A41G5/00 ,  A45D44/00

CPC classification number: A41G5/0086 ,  A45D44/00

Abstract: Applicators for grasping and applying small items, such as fibers and eyelashes, are disclosed. The applicators passively hold the items and a user actuates the applicator to release the items. An applicator includes a compression spring that forces a disc against a disc retention element to hold the items passively, and a button is pressed to separate the disc from the disc retention element to release the items. An applicator includes an expansion spring that holds items between coils of the spring passively, and a button is pressed to separate the spring coils to release the items.

公开(公告)号：US09820931B2

公开(公告)日：2017-11-21

申请号：US14513023

申请日：2014-10-13

Applicant: L'OREAL

Inventor： Aline Aude Guimont ,  Chunhua Li ,  Xianzhi Zhou ,  Hy Si Bui ,  Jean-Thierry Simonnet

IPC: A61K8/81 ,  A61K8/87 ,  A61Q3/02

CPC classification number: A61K8/8152 ,  A61K8/87 ,  A61Q3/02

Abstract: Provided are nail compositions comprising at least one photo-curable polymer dispersed in water (latex), at least one acrylic non-photo-curable polymer dispersed in water (latex), at least one photo-initiator, optionally at least one plasticizer, optionally a colorant, and water. Also provided are nail composition systems and kits comprising the nail compositions of the invention together with a base coat composition and/or a top coat composition.

公开(公告)号：US10912724B2

公开(公告)日：2021-02-09

申请号：US16117610

申请日：2018-08-30

Applicant: L'OREAL

Inventor： Aline Aude Guimont ,  Chunhua Li ,  Hubert Tunchiao Lam ,  Derek James Henry

IPC: A61Q3/00 ,  A61K8/34 ,  A61Q3/04 ,  A61K8/60 ,  A61K8/49 ,  A61K8/81

Abstract: The invention relates to compositions for removing nail polish comprising at least at least about 10% by weight of at least one polyhydric alcohol compound, at least one low carbon alcohol, at least one high boiling point ester compound, at least one thickening agent, and at least one abrasive compound, as well as to methods of removing nail polish from nails using such compositions.