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公开(公告)号:US12083201B2
公开(公告)日:2024-09-10
申请号:US17591075
申请日:2022-02-02
Applicant: L'OREAL
Inventor: Andrea E. Schott , Aline Guimont , Daniella Gonzalez-Toro
CPC classification number: A61K8/345 , A61K8/35 , A61K8/37 , A61K8/8158 , A61Q3/04 , A61K2800/31 , A61K2800/48 , A61K2800/5922
Abstract: Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.
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公开(公告)号:US11793743B2
公开(公告)日:2023-10-24
申请号:US16397492
申请日:2019-04-29
Applicant: L'OREAL
Inventor: Andrea E. Schott , Aline Guimont , Daniella Gonzalez-Toro
Abstract: Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and acetone. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of less than about 0.6. The composition further includes a cellulose polymer soluble in said C2-C3 monoalcohol. The concentration by weight of water in the composition is less than the concentration by weight of glycerin.
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公开(公告)号:US11911493B2
公开(公告)日:2024-02-27
申请号:US17502221
申请日:2021-10-15
Applicant: L'OREAL
Inventor: Andrea E. Schott , Aline Guimont , Daniella Gonzalez-Toro
CPC classification number: A61K8/345 , A61K8/35 , A61K8/8158 , A61Q3/04 , A61Q19/007 , A61K2800/28 , A61K2800/48 , A61K2800/5922
Abstract: Compositions are provided for removing nail polish that include a co-mixture of monoalcohol, glycerin, and solvent consisting of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The composition for includes a co-mixture of monoalcohol, glycerin, and solvent that consists of C2-C3 monoalcohol; glycerin; and less than 55% by weight of solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of greater than about 0.6. If the solvent includes C2-C4 alkyl acetate then the concentration of C2-C4 alkyl acetate is less than 30% by weight. The composition further includes polyacrylamide and water. The concentration by weight of water in the composition is less than the concentration by weight of glycerin. Methods are also provided.
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公开(公告)号:US11241372B2
公开(公告)日:2022-02-08
申请号:US16397551
申请日:2019-04-29
Applicant: L'OREAL
Inventor: Andrea E. Schott , Aline Guimont , Daniella Gonzalez-Toro
Abstract: Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.
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公开(公告)号:US11517774B2
公开(公告)日:2022-12-06
申请号:US17095261
申请日:2020-11-11
Applicant: L'OREAL
Inventor: Andrea E. Schott , Aline Aude Guimont
Abstract: The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.
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公开(公告)号:US11154472B2
公开(公告)日:2021-10-26
申请号:US16397559
申请日:2019-04-29
Applicant: L'OREAL
Inventor: Andrea E. Schott , Aline Guimont , Daniella Gonzalez-Toro
Abstract: Compositions are provided for removing nail polish that include a co-mixture of monoalcohol, glycerin, and solvent consisting of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The composition for includes a co-mixture of monoalcohol, glycerin, and solvent that consists of C2-C3 monoalcohol; glycerin; and less than 55% by weight of solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of greater than about 0.6. If the solvent includes C2-C4 alkyl acetate then the concentration of C2-C4 alkyl acetate is less than 30% by weight. The composition further includes polyacrylamide and water. The concentration by weight of water in the composition is less than the concentration by weight of glycerin. Methods are also provided.
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