Determining and controlling substrate temperature during substrate processing

    公开(公告)号:US12020960B2

    公开(公告)日:2024-06-25

    申请号:US17045887

    申请日:2019-04-08

    CPC classification number: H01L21/67248 G05B17/02 H01L21/67109 H01L21/68771

    Abstract: A temperature controller for substrate processing system includes memory that stores a temperature control model that correlates a heat transfer gas pressure and a first temperature of a substrate support to a second temperature of a substrate arranged on the substrate support, a temperature calculation module configured to calculate the second temperature of the substrate using the heat transfer gas pressure, the first temperature of the substrate support, and the temperature control model, and a heat transfer gas control module configured to adjust the heat transfer gas pressure based on the second temperature of the substrate calculated by the temperature calculation module and a desired third temperature of the substrate.

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