Lateral-type vacuum deposition apparatus, and source block and source assembly for the same

    公开(公告)号:US11732344B2

    公开(公告)日:2023-08-22

    申请号:US16596558

    申请日:2019-10-08

    CPC classification number: C23C14/24 H10K71/00

    Abstract: The present disclosure relates to a lateral-type vacuum deposition apparatus, and a source block and a source assembly for the same. Disclosed are a source block that may simplify a lateral-type vacuum deposition apparatus and a lateral-type vacuum deposition apparatus using the same. The source block has a predetermined shape. In the lateral-type vacuum deposition apparatus, the substrate and the source block may face away each other. Accordingly, the lateral-type vacuum deposition apparatus including the source block is free of a conduit for transferring a vaporized source to a nozzle, thereby simplifying a structure of the apparatus. In particular, the source block may have a visible light transmittance of at least about 10% and may exhibit excellent shape maintenance ability during a lateral-type vacuum deposition process.

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