ETCHANT, REPLENISHMENT SOLUTION AND METHOD FOR FORMING COPPER WIRING

    公开(公告)号:US20170260632A1

    公开(公告)日:2017-09-14

    申请号:US15124018

    申请日:2016-05-31

    CPC classification number: C23F1/18 C09K13/06 H05K3/067 H05K2203/0789

    Abstract: An etchant for copper includes an acid and one or more compounds selected from the group consisting of an aliphatic noncyclic compound, an aliphatic heterocyclic compound and a heteroaromatic compound. The aliphatic noncyclic compound is a saturated aliphatic noncyclic compound (A) including only two or more nitrogen atoms as heteroatoms, and 2 to 10 carbon atoms. The aliphatic heterocyclic compound is a compound (B) including a five-, six-, or seven-membered ring having one or more nitrogen atoms as one or more heteroatoms constituting the ring. The heteroaromatic compound is a compound (C) including a six-membered heteroaromatic ring having one or more nitrogen atoms as one or more heteroatoms constituting the ring.

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