公开(公告)号：US20200157394A1

公开(公告)日：2020-05-21

申请号：US16611250

申请日：2018-03-02

Applicant: MEC COMPANY LTD.

Inventor： Itsuro TOMATSU ,  Kosuke KUMAZAKI ,  Yasutaka AMITANI ,  Yuko SHIBANUMA ,  Ikuyo KATAYAMA

IPC: C09J179/02 ,  B32B15/08 ,  B32B15/20 ,  B32B37/12 ,  C23C22/06 ,  C23C22/63 ,  C23C22/68 ,  C09J11/04 ,  C09J5/02 ,  H05K3/38

Abstract: The coating film-forming composition includes an aromatic compound having an amino group and an aromatic ring in one molecule, and thio compound (sulfur oxoacids having a pKa of −1.9 or less and salts thereof are excluded). pH of the coating film-forming composition is 4 to 10. The thio compound is preferably one that ionized to form anions in a solution, and thiosulfate and thiocyanate are especially preferable. By bringing the coating film-forming composition into contact with the surface of a metal member, a coating film is formed on the surface of the metal member, so that a surface-treated metal member can be obtained.

公开(公告)号：US20170260632A1

公开(公告)日：2017-09-14

申请号：US15124018

申请日：2016-05-31

Applicant: MEC COMPANY LTD.

Inventor： Hirofumi KODERA ,  Ikuyo KATAYAMA ,  Shota HISHIKAWA

IPC: C23F1/18 ,  C09K13/06 ,  H05K3/06

CPC classification number: C23F1/18 ,  C09K13/06 ,  H05K3/067 ,  H05K2203/0789

Abstract: An etchant for copper includes an acid and one or more compounds selected from the group consisting of an aliphatic noncyclic compound, an aliphatic heterocyclic compound and a heteroaromatic compound. The aliphatic noncyclic compound is a saturated aliphatic noncyclic compound (A) including only two or more nitrogen atoms as heteroatoms, and 2 to 10 carbon atoms. The aliphatic heterocyclic compound is a compound (B) including a five-, six-, or seven-membered ring having one or more nitrogen atoms as one or more heteroatoms constituting the ring. The heteroaromatic compound is a compound (C) including a six-membered heteroaromatic ring having one or more nitrogen atoms as one or more heteroatoms constituting the ring.