摘要:
In a scanning type exposure apparatus, a reticle coarse movement stage 22 and a wafer stage 20 are simultaneously scanned in a predetermined scanning direction or directions, in which a position control system 44 for a reticle fine movement stage detects a positional discrepancy amount between the wafer stage 20 and the reticle fine movement stage 24, and calculates a vibration amount of a vibration-preventive pedestal 12. The both stages 20, 22 are driven and controlled so that positional discrepancy is corrected on the basis of the detected positional discrepancy amount and the calculated vibration amount. Accordingly, even if a vibration occurs on the vibration-preventive pedestal 12 during acceleration for scanning for the stages 20, 22, an error affected by the vibration is taken into consideration, and correction is made at a predetermined time interval so that the positional relationship between the stages 20, 24 becomes a predetermined synchronized relationship.
摘要:
When the position of a stage is detected by interferometers, a converting means converts information detected by the interferometers into information on a position and a velocity of a center of gravity of the stage concerning each of degrees of freedom. PI controllers provided for each of the degrees of freedom determine control amounts for each of the degrees of freedom necessary for movement of the center of gravity by means of (proportional+integral) operation on the basis of velocity deviations in respective directions obtained as differences between values obtained by conversion into velocities from positional deviations of the center of gravity in the .theta., Y, X directions and velocities of the center of gravity in the respective directions. Outputs of the respective controllers are inputted into a converting means which converts the input into control amounts to be generated in motors 12, 14, 16, 18 respectively, and give the control amounts after the conversion as command values to the respective motors. Mutual interference between control means is effectively avoided when the stage is driven by using driving devices of a number larger than the degrees of freedom. The stage apparatus may be applied to an exposure apparatus.