公开(公告)号：US20140134453A1

公开(公告)日：2014-05-15

申请号：US14017535

申请日：2013-09-04

Applicant: Microfabrica Inc.

Inventor： Ming Ting Wu ,  Rulon J. Larsen, III ,  Young Kim ,  Kieun Kim ,  Adam L. Cohen ,  Ananda H. Kumar ,  Michael S. Lockard ,  Dennis R. Smalley

IPC: B32B15/01

CPC classification number: G01R1/06761 ,  B32B15/01 ,  Y10T428/12486

Abstract: Some embodiments of the invention are directed to electrochemical fabrication methods for forming structures or devices (e.g. microprobes for use in die level testing of semiconductor devices) from a core material and a shell or coating material that (1) partially coats the surface of the structure, (2) completely coats the surface of the structure, and/or (3) completely coats the surface of structural material of each layer from which the structure is formed including interlayer regions. These embodiments incorporate both the core material and the shell material into the structure as each layer is formed along with a sacrificial material that is removed after formation of all layers of the structure. In some embodiments the core material may be a material that would be removed with sacrificial material if it were accessible by an etchant during removal of the sacrificial material.

Abstract translation: 本发明的一些实施方案涉及用于从核心材料和壳或涂层材料形成结构或器件（例如用于半导体器件的晶片级测试的微探针）的电化学制造方法，（1）部分地涂覆结构的表面 ，（2）完全涂覆结构的表面，和/或（3）完全涂覆包含中间层区域的结构形成的各层结构材料的表面。 这些实施例将芯材料和壳体材料结合到结构中，因为每个层与形成所述结构的所有层之后被去除的牺牲材料一起形成。 在一些实施例中，芯材料可以是如果在去除牺牲材料期间可通过蚀刻剂使用牺牲材料将其去除的材料。