公开(公告)号：US20010029895A1

公开(公告)日：2001-10-18

申请号：US09814277

申请日：2001-03-21

Applicant: NHK Spring Co., Ltd.

Inventor： Toshihiko Hanamachi ,  Toshihiro Tachikawa ,  Hideaki Fukuda

IPC: C23C016/00

CPC classification number: H01L21/67103 ,  C23C16/4586 ,  C23C16/46

Abstract: A ceramic cover plate is placed on the surface of a heater typically consisting of a ceramic heater used in a CVD device so as to cover the entire heating surface of the heater, and a silicon wafer 2 is placed on a recessed supporting surface 2a defined by the surface of the cover plate 2. The surface of the ceramic heater is therefore protected by the cover made of a ceramic plate, and the surface of the ceramic heater is prevented from being directly exposed to the gas such as the cleaning gas. Because the corrosion caused by the cleaning gas is limited to the cover, the ceramic heater can be renewed simply by replacing the cover. This substantially reduces the cost for the maintenance work.

Abstract translation: 将陶瓷盖板放置在通常由CVD装置中使用的陶瓷加热器组成的加热器的表面上，以覆盖加热器的整个加热表面，并且将硅晶片2放置在由 陶瓷加热器的表面由陶瓷板制成的盖子保护，并且防止陶瓷加热器的表面直接暴露于诸如清洁气体之类的气体。 由于清洁气体引起的腐蚀被限制在盖子上，所以可以通过更换盖子来简单地更换陶瓷加热器。 这大大降低了维护工作的成本。