CHEMICAL VAPOR DEPOSITION REACTOR WITH FILAMENT HOLDING ASSEMBLY
    1.
    发明申请
    CHEMICAL VAPOR DEPOSITION REACTOR WITH FILAMENT HOLDING ASSEMBLY 审中-公开
    化学气相沉积反应器与FILAMENT保持装配

    公开(公告)号:US20160122875A1

    公开(公告)日:2016-05-05

    申请号:US14534002

    申请日:2014-11-05

    Abstract: Polysilicon crystalline rods are formed by chemical vapor deposition in the reaction chamber of a Siemens reactor. Filament holding assemblies secure vertically extending filaments to electrodes located along the floor of the reactor. A filament holding assembly includes a chuck support member that is mounted on an electrode and that has an upwardly tapering side surface. A chuck is seated on the chuck support member with at least a portion of the chuck support member received within a cavity defined in the base of the chuck with the side surface of the chuck support member engaging the surface that defines the cavity. The cavity can sized and shaped such that a gap is defined between the distal end of the chuck support member and an end wall surface of the cavity. The chuck has an upwardly opening receptacle that receives and holds the end portion of an upwardly extending filament.

    Abstract translation: 通过化学气相沉积在西门子反应器的反应室中形成多晶硅结晶棒。 长丝保持组件将垂直延伸的细丝固定到位于反应器底部的电极。 灯丝保持组件包括安装在电极上并具有向上倾斜的侧表面的卡盘支撑构件。 卡盘位于卡盘支撑构件上,其中卡盘支撑构件的至少一部分容纳在限定在卡盘的基部中的空腔内,卡盘支撑构件的侧表面接合限定空腔的表面。 空腔可以尺寸和形状使得在卡盘支撑构件的远端和空腔的端壁表面之间限定间隙。 卡盘具有向上开口的容器,其容纳并保持向上延伸的细丝的端部。

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