APPARATUS AND METHOD FOR MANAGING A TEMPERATURE PROFILE USING REFLECTIVE ENERGY IN A THERMAL DECOMPOSITION REACTOR

    公开(公告)号:US20190145004A1

    公开(公告)日:2019-05-16

    申请号:US16247229

    申请日:2019-01-14

    Abstract: Embodiments of a reflective surface and a reflector comprising a reflective surface for use in a thermal decomposition reactor are disclosed. Methods for using the reflective surface, or reflector comprising the reflective surface, to manage a temperature profile in a silicon rod grown in the thermal decomposition reactor are also disclosed. The reflective surface is configured to receive radiant heat energy emitted from an energy emitting region of an elongated polysilicon body grown during chemical vapor deposition onto a silicon filament and reflect at least a portion of the received radiant heat energy to a reflected energy receiving region of the elongated polysilicon body or to a reflected energy receiving region of a second elongated polysilicon body, to thereby add radiant heat energy to the reflected energy receiving region.

    Apparatus and method for managing a temperature profile using reflective energy in a thermal decomposition reactor

    公开(公告)号:US10208381B2

    公开(公告)日:2019-02-19

    申请号:US14979934

    申请日:2015-12-28

    Abstract: Embodiments of a reflective surface and a reflector comprising a reflective surface for use in a thermal decomposition reactor are disclosed. Methods for using the reflective surface, or reflector comprising the reflective surface, to manage a temperature profile in a silicon rod grown in the thermal decomposition reactor are also disclosed. The reflective surface is configured to receive radiant heat energy emitted from an energy emitting region of an elongated polysilicon body grown during chemical vapor deposition onto a silicon filament and reflect at least a portion of the received radiant heat energy to a reflected energy receiving region of the elongated polysilicon body or to a reflected energy receiving region of a second elongated polysilicon body, to thereby add radiant heat energy to the reflected energy receiving region.

    APPARATUS AND METHOD FOR MANAGING A TEMPERATURE PROFILE USING REFLECTIVE ENERGY IN A THERMAL DECOMPOSITION REACTOR
    3.
    发明申请
    APPARATUS AND METHOD FOR MANAGING A TEMPERATURE PROFILE USING REFLECTIVE ENERGY IN A THERMAL DECOMPOSITION REACTOR 审中-公开
    在热分解反应器中使用反射能量管理温度曲线的装置和方法

    公开(公告)号:US20160177447A1

    公开(公告)日:2016-06-23

    申请号:US14979934

    申请日:2015-12-28

    Abstract: Embodiments of a reflective surface and a reflector comprising a reflective surface for use in a thermal decomposition reactor are disclosed. Methods for using the reflective surface, or reflector comprising the reflective surface, to manage a temperature profile in a silicon rod grown in the thermal decomposition reactor are also disclosed. The reflective surface is configured to receive radiant heat energy emitted from an energy emitting region of an elongated polysilicon body grown during chemical vapor deposition onto a silicon filament and reflect at least a portion of the received radiant heat energy to a reflected energy receiving region of the elongated polysilicon body or to a reflected energy receiving region of a second elongated polysilicon body, to thereby add radiant heat energy to the reflected energy receiving region.

    Abstract translation: 公开了一种反射表面和包括用于热分解反应器的反射表面的反射器的实施例。 还公开了使用反射表面或包括反射表面的反射器来管理在热分解反应器中生长的硅棒中的温度分布的方法。 反射表面被配置为接收从在化学气相沉积期间生长的长丝多晶硅体的能量发射区域发射的辐射热能,并将所接收的辐射热能的至少一部分反射到反射能量接收区域 细长多晶硅体或第二细长多晶硅体的反射能量接收区域,从而向反射能量接收区域增加辐射热能。

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