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公开(公告)号：US20210219545A1
公开(公告)日：2021-07-22
申请号：US17221550
申请日：2021-04-02
Applicant: RHODIA OPERATIONS
Inventor： Amit SEHGAL , Kamel RAMDANI , Christopher PLUMMER , Huw EVANS
Abstract: An antimicrobial composition that includes: an antimicrobial component having at least one quaternary ammonium compound; a synthetic polymer that includes: at least one cationic monomer Ab, optionally, at least one anionic monomer Ba, and optionally, at least one non-ionic monomer Ca; an organic acid; and a surfactant selected from cationic surfactants, amphoteric surfactants and combinations thereof, wherein the composition is free of non-ionic surfactants. This composition when applied to a surface provides robust long lasting disinfection.
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公开(公告)号：US20190307124A1
公开(公告)日：2019-10-10
申请号：US16379685
申请日：2019-04-09
Applicant: RHODIA OPERATIONS
Inventor： Amit SEHGAL , Thomas BROPHY , Kamel RAMDANI
Abstract: An antimicrobial composition that includes: an antimicrobial component having at least one quaternary ammonium compound; a cationic polysaccharide; an organic acid; and a surfactant selected from cationic surfactants, amphoteric surfactants, nonionic surfactants and combinations thereof. This composition when applied to a surface provides robust long lasting disinfection.
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Patent Agency Ranking
公开(公告)号：US20220295789A1
公开(公告)日：2022-09-22
申请号：US17832523
申请日：2022-06-03
Applicant: RHODIA OPERATIONS
Inventor： Amit SEHGAL , Tamara MAMISTVALOVA , Amanda TORRES , Celine Anna Simone BUREL , Kamel RAMDANI
Abstract: The present disclosure provides an antimicrobial composition that includes: an antimicrobial component having at least one quaternary ammonium compound; a synthetic polymer that includes: at least one cationic monomer Ab, optionally, at least one anionic monomer Ba, and optionally, at least one non-ionic monomer Ca; an organic acid; and a surfactant selected from cationic surfactants, amphoteric surfactants and combinations thereof; and at least one non-ionic surfactant selected from the group consisting of low hydrophilic-lipophilic balance (HLB) non-ionic surfactants with a delocalized electronic structure that have moderate to poor water solubility. This composition when applied to a surface demonstrates good cleaning ability and provides robust long lasting disinfection.
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公开(公告)号：US20200253203A1
公开(公告)日：2020-08-13
申请号：US16789940
申请日：2020-02-13
Applicant: RHODIA OPERATIONS
Inventor： Amit SEHGAL , Tamara MAMISTVALOVA , Amanda TORRES , Celine BUREL , Kamel RAMDANI
IPC: A01N33/12
Abstract: The present disclosure provides an antimicrobial composition that includes: an antimicrobial component having at least one quaternary ammonium compound; a synthetic polymer that includes: at least one cationic monomer Ab, optionally, at least one anionic monomer Ba, and optionally, at least one non-ionic monomer Ca; an organic acid; and a surfactant selected from cationic surfactants, amphoteric surfactants and combinations thereof; and at least one non-ionic surfactant selected from the group consisting of low hydrophilic-lipophilic balance (HLB) non-ionic surfactants with a delocalized electronic structure that have moderate to poor water solubility. This composition when applied to a surface demonstrates good cleaning ability and provides robust long lasting disinfection.
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公开(公告)号：US20230119350A1
公开(公告)日：2023-04-20
申请号：US17973691
申请日：2022-10-26
Applicant: RHODIA OPERATIONS
Inventor： Amit SEHGAL , Thomas BROPHY , Kamel RAMDANI
Abstract: An antimicrobial composition that includes: an antimicrobial component having at least one quaternary ammonium compound; a cationic polysaccharide; an organic acid; and a surfactant selected from cationic surfactants, amphoteric surfactants, nonionic surfactants and combinations thereof. This composition when applied to a surface provides robust long lasting disinfection.
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公开(公告)号：US20210251225A1
公开(公告)日：2021-08-19
申请号：US17173234
申请日：2021-02-11
Applicant: RHODIA OPERATIONS
Inventor： Amit SEHGAL , Laura GAGE , Kamel RAMDANI
IPC: A01N33/12 , A01N37/36 , A01N37/02 , A01N25/30 , A01N25/10 , C11D3/48 , C11D1/94 , C11D3/30 , C11D11/00
Abstract: The present disclosure provides a method for killing pathogens on a surface, the method comprising applying a composition to the surface, the composition comprising: at least one quaternary ammonium compound; a polymer comprising one or more types of monomer units selected from cationic monomer units, anionic monomer units, amphoteric monomer units, non-ionic monomer units, and combinations thereof, wherein at least one cationic monomer unit, amphoteric monomer unit or at least one anionic monomer unit is present when the polymer comprises one or more non-ionic monomer units; a surfactant selected from cationic surfactants, amphoteric surfactants, non-ionic surfactants, and combinations thereof; and, optionally, an organic acid, wherein the pH of the composition is less than 5; and the composition achieves at least 0.5 log reduction in the amount of live pathogens on the surface, wherein the pathogens are selected from bacterial spores, fungal spores, non-enveloped viruses and combinations thereof within about 60 minutes, under conditions of standard temperature and pressure.
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公开(公告)号：US20190307122A1
公开(公告)日：2019-10-10
申请号：US16379708
申请日：2019-04-09
Applicant: RHODIA OPERATIONS
Inventor： Amit SEHGAL , Kamel RAMDANI , Christopher PLUMMER , Huw EVANS
Abstract: An antimicrobial composition that includes: an antimicrobial component having at least one quaternary ammonium compound; a synthetic polymer that includes: at least one cationic monomer Ab, optionally, at least one anionic monomer Ba, and optionally, at least one non-ionic monomer Ca; an organic acid; and a surfactant selected from cationic surfactants, amphoteric surfactants and combinations thereof, wherein the composition is free of non-ionic surfactants. This composition when applied to a surface provides robust long lasting disinfection.
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